[PDF][PDF] Vertical Etching of Scandium Aluminum Nitride Thin Films Using TMAH Solution. Nanomaterials 2023, 13, 274

A Shifat, I Stricklin, RK Chityala, A Aryal, G Esteves… - 2023 - academia.edu
A wide bandgap, an enhanced piezoelectric coefficient, and low dielectric permittivity are
some of the outstanding properties that have made ScxAl1− xN a promising material in …

Vertical etching of scandium aluminum nitride thin films using TMAH solution

ASMZ Shifat, I Stricklin, RK Chityala, A Aryal, G Esteves… - Nanomaterials, 2023 - mdpi.com
A wide bandgap, an enhanced piezoelectric coefficient, and low dielectric permittivity are
some of the outstanding properties that have made Sc x Al 1− x N a promising material in …

Etching of scandium-doped aluminum nitride using inductively coupled plasma dry etch and tetramethyl ammonium hydroxide

ASMZ Shifat, I Stricklin, RK Chityala, A Aryal, G Esteves… - MRS Advances, 2023 - Springer
Abstract Properties such as wide bandgap, higher electromechanical coupling, and low
dielectric permittivity have propelled Sc x Al1− x N as an advantageous material for …

Chemically enhanced dry etching of Al0. 7Sc0. 3N for MEMS applications

N Andrianov, A De Pastina… - … /In press) 48th …, 2022 - silicon-austria-labs.elsevierpure.com
In the present work, we investigate the effect of substrate temperature and RF bias power on
the dry etching process of Al0. 7Sc0. 3N thin films. Increasing the substrate temperature from …

Tunable Etch Profile for Scandium Doped Aluminum Nitride Piezoelectric Film

QZ Jiang, L Huamao, TY Fung… - 2022 IEEE 24th …, 2022 - ieeexplore.ieee.org
Scandium-doped Aluminum Nitride (Sc_xAl_1-xN) is reported to have attractive
piezoelectric, pyroelectric and electro-optic properties with increased Sc concentration …

[HTML][HTML] The impact of argon admixture on the c-axis oriented growth of direct current magnetron sputtered ScxAl1− xN thin films

PM Mayrhofer, C Eisenmenger-Sittner… - Journal of Applied …, 2014 - pubs.aip.org
The piezoelectric properties of wurtzite aluminium nitride (w-AlN) are enhanced by alloying
with scandium (Sc), thus offering superior properties for applications in micro electro …

Characterization of AlN and AlScN film ICP etching for micro/nano fabrication

Z Luo, S Shao, T Wu - Microelectronic Engineering, 2021 - Elsevier
We investigate the inductively coupled plasma (ICP) etching characteristics of (0002)
Aluminum Nitride (AlN) and Aluminum Scandium Nitride (Al 0.94 Sc 0.06 N) piezoelectric …

Highly selective chemical dry etching of silicon nitride over silicon and silicon dioxide

GS Oehrlein, B Kastenmeier, P Matsuo - US Patent 6,060,400, 2000 - Google Patents
Typical LOCOS includes using a thin oxide layer between the nitride mask and the Silicon
wafer to provide StreSS relief during thermal oxidation. However, thermal oxidation of …

Investigation of ScAlN for piezoelectric and ferroelectric applications

R Petrich, H Bartsch, K Tonisch… - … & Exhibition (EMPC), 2019 - ieeexplore.ieee.org
Sc_XAl_-XN is a promising material to expand the application range of nitride materials,
since scandium increases the piezoelectric constants while retaining the crystalline wurtzite …

[HTML][HTML] Piezoelectric aluminum nitride thin-films: A review of wet and dry etching techniques

RMR Pinto, V Gund, C Calaza, KK Nagaraja… - Microelectronic …, 2022 - Elsevier
Aluminum nitride (AlN) is a technologically relevant material that can be deposited at low
temperatures in the form of thin-films while preserving most of its physical properties …