Sub-5 nm AFM tip characterizer based on multilayer deposition technology

Z Wu, Y Xiong, L Lei, W Tan, Z Tang, X Deng, X Cheng… - Photonics, 2022 - mdpi.com
Atomic force microscope (AFM) is commonly used for three-dimensional characterization of
the surface morphology of structures at nanoscale, but the “Inflation effect” of the tip is an …

Toward accurate linewidth metrology using atomic force microscopy and tip characterization

RG Dixson, J Schneir, TH McWaid… - … Process Control for …, 1996 - spiedigitallibrary.org
Atomic force microscopes (AFMs) are potentially capable of dimensional metrology with
nanometer scale accuracy. Feature width measurements, however, can be severely affected …

Measurement of deep groove structures using a self-fabricated long tip in a large range metrological atomic force microscope

SH Wang, SL Tan, G Xu, K Koyama - Measurement Science and …, 2011 - iopscience.iop.org
Metrological atomic force microscopes are widely used in national metrology institutes for
measuring step height, lateral pitch and surface roughness. However, the maximum …

Characterizing atomic force microscopy tip shape in use

C Wang, H Itoh, J Sun, J Hu, D Shen… - … of Nanoscience and …, 2009 - ingentaconnect.com
A new tip characterizer based on the fabrication of multilayer thin films for atomic force
microscopy (AFM) was developed to analyze the effective tip shape while in use. The …

Tip characterizer for atomic force microscopy

H Itoh, T Fujimoto, S Ichimura - Review of scientific instruments, 2006 - pubs.aip.org
A tip characterizer for atomic force microscopy (AFM) was developed based on the
fabrication of multilayer thin films. Comb-shaped line and space (LS) and wedge-shaped …

Tip characterization method using multi-feature characterizer for CD-AFM

NG Orji, H Itoh, C Wang, RG Dixson, PS Walecki… - Ultramicroscopy, 2016 - Elsevier
In atomic force microscopy (AFM) metrology, the tip is a key source of uncertainty. Images
taken with an AFM show a change in feature width and shape that depends on tip geometry …

Manufacturing and advanced characterization of sub-25nm diameter CD-AFM probes with sub-10nm tip edges radius

J Foucher, P Filippov, C Penzkofer… - … Process Control for …, 2013 - spiedigitallibrary.org
Atomic force microscopy (AFM) is increasingly used in the semiconductor industry as a
versatile monitoring tool for highly critical lithography and etching process steps …

Tip characterization for CD-AFM: getting to 2 nm, 3 sigma

K Miller, A Chand, G Dahlen… - Metrology, Inspection, and …, 2002 - spiedigitallibrary.org
We present nanometer-scale physical structures and analysis algorithms for characterizing
tip width and shape for critical dimension atomic force microscopy (CD-AFM). Automated CD …

AFM tip characterizer fabricated by Si/SiO2 multilayers

H Takenaka, M Hatayama, H Ito, T Ohchi… - e-Journal of Surface …, 2011 - jstage.jst.go.jp
An atomic force microscopy (AFM) tip characterizer with measurement ranges from 7.7 nm to
131 nm was developed using Si/SiO2 multilayers. This characterizer was constructed with …

Sidewall slope sensitivity of CD-AFM

A Cordes, B Bunday, E Cottrell - … , Metrology, and Standards for …, 2011 - spiedigitallibrary.org
In this paper, we explore the sensitivity of three-dimensional atomic force microscopy to
incremental variation in the sidewall angle of near-vertical features. Measurement results …