The kinetics of decomposition of Na2SiF6 in nitrogen to in situ synthesize Si3N4 was
investigated. First, an optimization of the following parameters for the thermal decomposition …

The aim of this investigation was to synthesize Si3N4 through the reaction of nitrogen with
SiF4 (g) produced during the thermal decomposition of sodium hexafluorosilicate (Na2SiF6) …

A simple, seedless method for the synthesis of Si 3 N 4 from a hydrogen–free precursor
system (Na 2 SiF 6 (s)–N 2 (g)) was developed. From thermodynamic calculations and …

ABSTRACT Sodium hexafluorosilicate (Na2SiF6) powder has been used as a silicon source
for formation of Si3N4 coatings by the hybrid precursor system‐chemical vapor deposition …

Due to contamination and corrosion problems caused by silicon fluoride vaporization in
steelmaking plants, the formation/dissociation of Na2SiF6 has become the subject of many …

Abstract Silicon nitride (Si 3 N 4) and oxynitride (Si 2 N 2 O) were deposited by chemical
vapor infiltration (CVI) through a novel route involving the in-situ thermal decomposition of …

Spontaneous fluoride emissions from high-temperature processes can result in an
increased atmospheric fluorine content and environmental contamination. Slags containing …

It has been shown that raising the oxygen impurity concentration in starting mixture
components reduces the temperature of the α–β phase transition of silicon nitride. At oxygen …

Deposition of α‐Si3N4 from SiF4 and NH3 was systematically studied using an
axisymmetric, vertical hot‐wall reactor in the temperature range of 1340° to 1490° C. The …

The behavior of reaction powder mixtures of stoichiometric compositions calculated for the
synthesis of higher niobium nitride and silicide in the temperature range 800–1400° С in …