Masks for laser processing are generated by laser ablation patterning of dielectric layer
systems. The application of these masks for the rapid fabrication of diffractive optical …

Excimer laser ablation is a versatile method to generate 2-or 3-D microstructured devices for
mechanics, fluidics, and optics. Particularly, if in 1-D the structure is predefined by a layer …

Ablation patterning of layered systems enables very precise ablation depth control. Within a
certain process window, the ablation depth does not depend critically on the laser fluence …

A new method for simple and economic fabrication of diffractive optical elements (DOEs)
with three and four phase levels, by UV nanosecond (ns) laser ablation is presented. The …

Excimer laser ablation at 193 nm is used for the generation of a surface relief structure on
fused silica with the aim to fabricate diffractive optical phase elements to be applied for …

Dielectric interference layer systems designed for high reflectivity at 248 nm are patterned by
ArF-excimer laser ablation (193 nm). Each single pulse ArF-laser exposure in vacuum at a …

A novel method is presented to manufacture multilevel diffractive optical elements (DOEs) in
polymer by single-step KrF excimer laser ablation using a halftone mask. The DOEs have a …

We present a novel use of micro-machining with excimer laser: realization of reflective
diffractive optical elements (DOE) for laser marking. The DOE's design is first calculated …

We propose a low cost technique for the production of diffractive optical elements (DOE).
These elements are devoted to high power lasers beam shaping in the mid-infrared …

F 2-laser ablation at 157 nm was used for generating sub-micron surface relief structures on
fused silica to define binary diffractive phase elements (DPE). A pattern array of 128 x 128 …