One of the most important factors that limit the performance of diffractive optical elements
(DOE's) is the depth accuracy of the relief structure. A common procedure for fabricating …

This paper considers the effect of errors in the technological process using an optimized
contour mask technique for fabricating piecewise continuous relief diffractive optical …

A new approach to designing computer-generated multilevel diffractive elements, in which
the phase and the amplitude of the output wavefront can be controlled independently, is …

With enhanced performance of computing facilities the iterative design of phase diffractive
optical elements (DOEs) has become widely accepted. A great number of up-to-date …

This paper gives an estimate of the limiting allowable deviations of the microrelief
parameters of diffractive optical elements (DOEs) based on processing errors. Results are …

With the constant shrinking of printable critical dimensions in photolithography, off-axis
illumination (OAI) becomes one of the effective resolution-enhancement methods facing …

We give a review of the findings of an investigation into a photolithographical method of
fabricating diffractive optical elements (DOEs), based on the use of only one photomask with …

We present a method for determining the optimal quantized phase levels for phase-only
diffractive optical elements by taking into account a modified probability-density function …

We present a model based on refractive index difference analysis for optimization of material
selection for multilayer diffractive optical elements (MLDOEs). From the proposed model, two …

This paper presents the investigation results of a new photolithographic fabrication method
of highly effective diffractive optical elements (DOE). The method, unlike the well-known …