Fabrication of diffractive optical elements by ArF-laser ablation of fused silica

J Bekesi, D Schaefer, J Ihlemann… - Photon Processing in …, 2003 - spiedigitallibrary.org
Excimer laser ablation at 193 nm is used for the generation of a surface relief structure on
fused silica with the aim to fabricate diffractive optical phase elements to be applied for …
被引用次数：10 相关文章

[引用][C] Fabrication of diffractive optical elements by ArF-laser ablation of fused silica

J BEKESI, D SCHÄFER, J IHLEMANN… - SPIE proceedings …, 2003 - pascal-francis.inist.fr
Fabrication of diffractive optical elements by ArF-laser ablation of fused silica CNRS Inist
Pascal-Francis CNRS Pascal and Francis Bibliographic Databases Simple search Advanced …

Fabrication of diffractive optical elements by ArF-laser ablation of fused silica

J Bekesi, D Schaefer, J Ihlemann… - Society of Photo …, 2003 - ui.adsabs.harvard.edu
Excimer laser ablation at 193 nm is used for the generation of a surface relief structure on
fused silica with the aim to fabricate diffractive optical phase elements to be applied for …

Fabrication of diffractive optical elements by ArF-laser ablation of fused silica

J Bekesi, D Schaefer, J Ihlemann, P Simon - spiedigitallibrary.org
Excimer laser ablation at 193 nm is used for the generation of a surface relief structure on
fused silica with the aim to fabricate diffractive optical phase elements to be applied for …

[引用][C] Fabrication of diffractive optical elements by ArF-laser ablation of fused silica

J BEKESI, D SCHÄFER… - SPIE …, 2003 - Society of Photo-Optical …