Low pass filtering taking place in the projection tools used by IC industry leads to a range of
optical proximity effects resulting in undesired IC characteristics. To correct these predicable …

Optical imaging of IC critical designs is impacted by optical proximity effects, OPEs,
originating from finite numerical aperture of projection lenses used in modern projectors …

To meet the imaging resolution requirements, driven by the evolution of IC design rules,
leading-edge scanners incorporate projection lenses with hyper-NAs. Moreover, immersion …

Of keen interest to the IC industry are advanced computational lithography applications such
as Optical Proximity Correction of IC layouts (OPC), scanner matching by optical proximity …

A precise lithographic model has always been a critical component for the technique of
Optical Proximity Correction (OPC) since it was introduced a decade ago [1]. As …

2. Description of Related Art Integrated circuits are fabricated by lithographic techniques,
where energy beams transmit integrated circuit images or patterns on photomasks to …

An accurate process model has always been the key for successful implementation of model-
based Optical Proximity Correction (OPC). As CD control requirements become severe at …

Production optical proximity correction (OPC) tools employ compact optical models in order
to accurately predict complicated optical lithography systems with good theoretical accuracy …

A technique traditionally used for optical proximity correction (OPC) is extended to include
topography proximity effects (TPE). Central to this is a thin-mask imaging model capable of …

Some practical aspects of integrating a mask modeling solution into the Optical Proximity
Correction (OPC) framework are discussed. Specifically, investigations were performed to …