Biaxial ellipsometry is a technique that measures the dielectric tensor and thickness of a
biaxial substrate, single-layer thin film, or multi-layer structure. The dielectric tensor of a …

A technique for measuring dielectric tensors in anisotropic layered structures, such as thin
films of biaxial materials, is demonstrated. The ellipsometric data are collected in a quasi …

Biaxial ellipsometry measures the optical constants of materials, anisotropic films, and
stacks of anisotropic films. Materials of interest include birefringent crystals, polarizing …

Dielectric tensors of anisotropic substrates and films can be determined by biaxial
ellipsometry, an extension of conventional ellipsometry. This technique utilizes an angle‐of …

A new technique for simultaneous multi-angle ellipsometric measurements of anisotropic
optical structures such as films used in the display industry is introduced. A very small area …

A high speed Mueller matrix imaging polarimeter is presented. The instrument enables
measurement of the full Mueller matrix in transmission, reflection, or retro-reflection. The …

Mueller matrix polarimetry (MMP) is a technique capable of determining a material's effect
on polarized light. However, there are limiting factors that can be optimized to improve the …

Full Mueller matrix measurements allow for elimination of ambiguity and a fuller
understanding of polarization metrology. The Exicor® 150XT system offers complete Mueller …

The design and operation of a Mueller matrix imaging polarimeter (MMIP) are presented.
The instrument is configurable to operate in transmission, reflection, retroreflection, and …

A Mueller matrix imaging polarimeter is used to acquire polarization-sensitive images of
seven different manmade samples in multiple scattering geometries. Successive Mueller …