Dry etching of Al-rich AlGaAs with silicon nitride masks for photonic crystal fabrication

X Zhang, Y Togano, K Hashimura… - Japanese Journal of …, 2015 - iopscience.iop.org
We investigate inductively coupled plasma (ICP) deep dry etching of Al 0.8 Ga 0.2 As for
photonic crystal (PC) fabrication using a Cl 2/BCl 3/CH 4 gas mixture. On the basis of our …
被引用次数：9 相关文章

Dry etching of Al-rich AlGaAs with silicon nitride masks for photonic crystal fabrication

X Zhang, Y Togano, K Hashimura… - … Journal of Applied …, 2015 - ui.adsabs.harvard.edu
We investigate inductively coupled plasma (ICP) deep dry etching of Al 0.8 Ga 0.2 As for
photonic crystal (PC) fabrication using a Cl 2/BCl 3/CH 4 gas mixture. On the basis of our …

[引用][C] Dry etching of Al-rich AlGaAs with silicon nitride masks for photonic crystal fabrication

X Zhang, Y Togano, K Hashimura, M Morifuji… - Japanese Journal of …, 2015 - cir.nii.ac.jp
Dry etching of Al-rich AlGaAs with silicon nitride masks for photonic crystal fabrication | CiNii
Research CiNii 国立情報学研究所 学術情報ナビゲータ[サイニィ] 詳細へ移動 検索フォームへ …