The functional form of coating-induced polarization aberrations in EUV lithography systems
is evaluated through polarization ray tracing of an example 3× EUV scanner with state-of-the …

摘要 In order to achieve high imaging requirement of projection lithography lens, the impact
of polarization effects induced by coatings need to be considered and analyzed during the …

The mechanism of coating induced polarization state variation is analysed by the Jones
matrix. Pauli spin matrices are used to establish the relationship between coating induced …

The Physikalisch-Technische Bundesanstalt (PTB) with its laboratory at the electron storage
ring BESSY II supports the national and European industry by carrying out high-accuracy at …

Multilayer coatings induce a significant polarization aberration in optical systems with high
numerical aperture (NA) and wide field of view, which will cause wavefront distortion and …

The effects of EUV scanner actuated overlay corrections on image fidelity are discussed.
Intrafield overlay corrections are implemented by reticle and/or wafer stage modulations …

We used electromagnetic simulation to study the effect of multilayer coating defects on the
areal image of reflective masks for EUV projection lithography. Calculated results show that …

The development of EUV lithography depends strongly on the availability of suitable
metrology equipment. The Physikalisch-Technische Bundesanstalt (PTB) with its laboratory …

The non-zero chief ray angle at the object (CRAO) in EUVL systems introduces azimuthally
asymmetric phase shifts. Understanding and characterizing these effects is critical to EUVL …

Skew aberration is an intrinsic rotation of polarization states due to the geometric
transformation of local coordinates via parallel transport of vectors. Skew aberration is a …