A Hydrogen plasma treatment for soft and selective silicon nitride etching

M Bouchilaoun, A Soltani, A Chakroun… - … status solidi (a), 2018 - Wiley Online Library
In this paper, the development of a soft and selective method to increase the etching rate
and control accurately the etched thickness of Si3N4 material is reported. This technique …

[PDF][PDF] A Hydrogen Plasma Treatment for Soft and Selective Silicon Nitride Etching

M Bouchilaoun, A Soltani, AJ Ahmed Chakroun… - … . Status Solidi A, 2018 - academia.edu
In this paper, the development of a soft and selective method to increase the etching rate
and control accurately the etched thickness of Si3N4 material is reported. This technique …

A Hydrogen Plasma Treatment for Soft and Selective Silicon Nitride Etching

M Bouchilaoun, A Soltani, A Chakroun… - physica status solidi …, 2018 - hal.science
In this paper, the development of a soft and selective method to increase the etching rate
and control accurately the etched thickness of Si3N4 material is reported. This technique …

A Hydrogen Plasma Treatment for Soft and Selective Silicon Nitride Etching

M Bouchilaoun, A Soltani, AJ Ahmed Chakroun… - physica status solidi …, 2018 - cir.nii.ac.jp
抄録< jats: sec>< jats: label/>< jats: p> In this paper, the development of a soft and selective
method to increase the etching rate and control accurately the etched thickness of Si< jats …

[引用][C] A Hydrogen Plasma Treatment for Soft and Selective Silicon Nitride Etching

M Bouchilaoun, A Soltani, A Chakroun… - Physica Status …, 2018 - ui.adsabs.harvard.edu
A Hydrogen Plasma Treatment for Soft and Selective Silicon Nitride Etching - NASA/ADS Now
on home page ads icon ads Enable full ADS view NASA/ADS A Hydrogen Plasma Treatment for …

A Hydrogen Plasma Treatment for Soft and Selective Silicon Nitride Etching.

M Bouchilaoun, A Soltani, A Chakroun… - … Status Solidi. A …, 2018 - search.ebscohost.com
In this paper, the development of a soft and selective method to increase the etching rate
and control accurately the etched thickness of Si< sub> 3 N< sub> 4 material is reported …