Thin-film solar cells fabricated using the epitaxial lift-off (ELO) process enable considerable
cost reduction as well as light-trapping. A polyimide film was used as a support substrate for …

Using the epitaxial lift-off (ELO) technique, a III–V device structure can be separated from its
GaAs substrate by selective wet etching of a thin release layer. The thin-film structures …

The epitaxial lift-off (ELO) technique was used in forming a thin-film GaInP/GaAs two-
junction monolithic tandem solar cell structure. First, the GaInP single junction solar cell to …

Epitaxial lift-off is used to create thin-film III–V solar cells without sacrificing the GaAs wafer. It
is based on selective etching of an AlAs release layer between the wafer and the cell …

MicroLink Devices has developed an epitaxial liftoff (ELO) technology for removing thin
device layers from the surface of a semiconductor wafer using a flexible metallic sheet to …

This study reports the use of cross-shaped pattern epitaxial lift-off (ELO) technology to
release crack-free single crystal epilayers with a solar cell structure from a gallium arsenide …

We demonstrate the fabrication of GaAs thin-film solar cells on plastic substrate by
combining epitaxial lift-off (ELO) and cold weld bonding. A lattice-matched epitaxial …

We have investigated the improvement of GaAs substrate reusing and the regrowth
possibility of the epi-layer for the flexible InGaP/GaAs double junction solar cell. The …

Epitaxial lift-off (ELO) techniques enable the development of thin-film III–V solar cell devices
that are flexible and lightweight. To this end, we report an ELO process employing an …

MicroLink Devices is currently transitioning into production a wafer-scale, epitaxial lift-off
process technology for GaAs-and InP-based materials. This process enables the separation …