Anodic imprint lithography patterns the GaAs substrate electrochemically by applying a
voltage through a predefined anodic stamp. This newly devised technique performs anodic …

We introduce a method for the direct imprinting of GaAs substrates using wet-chemical
stamping. The predefined patterns on the stamps etch the GaAs substrates via metal …

Electrochemical nanoimprint lithography (ECNL) has emerged as a promising technique for
fabricating three‐dimensional micro/nano‐structures (3D‐MNSs) directly on semiconductor …

Well-defined surface patterns can be applied to improve surface characteristics, optical
properties, and wettability. Electrochemical imprint lithography is a promising method for …

Soft-lithography and nanoimprinting lithography have been critical in manufacturing 3D
features with sub-20 nm resolution onto polymeric materials. However, methods for …

Silicon is an excellent transparent material for building IR micro-optical elements such as
holographic and blazed gratings, and curvilinear micro-lenses. Shaping this material in 3D …

The functional three dimensional micro-nanostructures (3D-MNS) play crucial roles in
integrated and miniaturized systems because of the excellent physical, mechanical, electric …

This letter presents a solid-state electrochemical nanoimprint process for direct patterning of
metallic nanostructures. It uses a patterned solid electrolyte or superionic conductor (such as …

A novel strategy to achieve 3D pattern transfer into silicon in a single step without using
lithography is presented. Etching is performed electrochemically in HF media by contacting …

Conventional lithography using photons and electrons continues to evolve to scale down
three-dimensional nanoscale patterns, but the complexity of technology and equipment is …