Over the past several years, stacked nanosheet gate-all-around (GAA) transistors captured
the focus of the semiconductor industry and have been identified as the lead architecture to …

Surface Metrology for Micro-and Nanofabrication presents state-of-the-art measurement
technologies for surface metrology in fabrication of micro-and nanodevices or components …

In this work, the novel enhancement to multichannel scatterometry data collection, Spectral
Interferometry, is introduced and discussed. The Spectral Interferometry technology adds …

Working at the nano-scale demands an understanding of the high-precision measurement
techniques that make nanotechnology and advanced manufacturing possible. Richard …

Scatterometry is a fast, precise and low cost way to determine the mean pitch and
dimensional parameters of periodic structures with lateral resolution of a few nanometer. It is …

The complex vertically stacked gate-all-around (GAA) manufacturing process drives the
demand for more challenging inline metrology requirements. GAA technology with specific …

Nanoelectronics is changing the way the world communicates, and is transforming our daily
lives. Continuing Moore's law and miniaturization of low-power semiconductor chips with …

This paper presents the development of a metrology framework and proof-of-concept tool to
perform direct, nanometer-scale topography measurements for real-time process control in …

The Handbook of Surface and Nanometrology explains and challenges current concepts in
nanotechnology. It covers in great detail surface metrology and nanometrology and more …

This paper will provide a high level overview of the future for in-line high volume
manufacturing (HVM) metrology for the semiconductor industry, concentrating on logic …