Exposure strategy and crystallization of Ge-Sb-Te thin film by maskless phase-change lithography
RW Ni, BJ Zeng, JZ Huang, T Luo, Z Li… - Optical …, 2015 - spiedigitallibrary.org
Maskless phase-change lithographic technology is developed as a photoresist of phase-
change materials. The controllable growth behavior of the crystallization region on an …
change materials. The controllable growth behavior of the crystallization region on an …