A new two-step method, facilitating the rapid generation of super-hydrophobic surface
structures via parallel laser processing followed by a replica generation by injection molding …

Parallel nanohole drilling in glass using an ArF excimer laser (193 nm) is demonstrated. For
the first time, hole arrays with 500 nm pitch and individual holes with 250 nm diameter and …

Silicon suboxide (SiO x, x≈ 1) is a substoichiometric silicon oxide with a large refractive
index and optical absorption coefficient that oxidizes to silica (SiO2) by annealing in air at …

Surface-relief gratings on optical materials are required for various telecommunication
applications, as light couplers for planar optical waveguides, Bragg reflectors, or alignment …

In this Letter, we report on the near-surface modification of fused silica by applying a
hydrogenous atmospheric pressure plasma jet at ambient temperature. A significant …

In this contribution, we report on a novel hybrid laser-plasma method for material processing
applications. This method is based on the combination of both an ArF excimer laser (λ= 193 …

Precise patterning by laser ablation requires sufficient absorption. For weak absorbers like
fused silica indirect methods using external absorbers have been developed. A novel …

We present a novel method for the development of diffractive optical elements (DOEs).
Unlike standard surface relief DOEs, the phase shift is introduced through a refractive index …

Well defined regions of silicon suboxide (SiO x) thin films deposited on fused silica
substrates by vacuum evaporation are transferred to a receiver substrate by pulsed laser …

UV-absorbing silicon monoxide (SiO x, x≈ 1) thin films on fused silica substrates are
irradiated by an ArF excimer laser (wavelength 193 nm) in the sub-ablation threshold …