Thinned GaInP/GaInAs/Ge solar cells grown with reduced cracking on Ge| Si virtual substrates

I García, L Barrutia, S Dadgostar, M Hinojosa… - Solar Energy Materials …, 2021 - Elsevier
Reducing the formation of cracks during growth of GaInP/GaInAs/Ge 3-junction solar cells on
Ge| Si virtual substrates has been attempted by thinning the structure, namely the Ge bottom …

Measurement of Exciton and Trion Energies in Multistacked hBN/WS2 Coupled Quantum Wells for Resonant Tunneling Diodes

MJ Lee, DH Seo, SM Kwon, D Kim, Y Kim, WS Yun… - ACS …, 2020 - ACS Publications
Quantum confinements, especially quantum in narrow wells, have been investigated
because of their controllability over electrical parameters. For example, quantum dots can …

Fabrication of penetrating pores in epitaxial Ge-on-Si through preferential etching along threading dislocations

Y Zhu, Y Zhang, B Li, GM Xia, RT Wen - Electrochimica Acta, 2024 - Elsevier
Abstract Epitaxial Ge-on-Si possesses a high density of threading dislocations (TDs) due to
the lattice mismatch and difference in thermal expansion coefficient. By employing the lattice …

Performance of III–V solar cells grown on reformed mesoporous Ge templates

A Cavalli, N Alkurd, S Johnston… - IEEE Journal of …, 2021 - ieeexplore.ieee.org
We demonstrate a solar cell on reformed porous Ge with an efficiency of 7.7%. We generate
mesopores in (100) Ge by bipolar electrochemical etching and anneal them at high …

The effect of passivation to etching duration ratio on bipolar electrochemical etching of porous layer stacks in germanium

W Schreiber, T Liu, S Janz - Journal of Physics and Chemistry of Solids, 2023 - Elsevier
The effect of the passivation to etching duration ratio on the bipolar electrochemical etching
of highly p-doped germanium on its pore structures has been investigated. The final goal is …

High-temperature nucleation of GaP on v-grooved si

TE Saenz, WE McMahon, AG Norman… - Crystal Growth & …, 2020 - ACS Publications
The use of nanopatterned {111}-faceted v-grooves has recently shown promise for growing
high-quality III–V material on Si. Here, we study the effect of reactor conditions and surface …

Antiphase boundary free InP microridges on (001) silicon by selective area heteroepitaxy

B Shi, A Goswami, AA Taylor… - Crystal Growth & …, 2020 - ACS Publications
Heteroepitaxy of III–V compound semiconductors on silicon (Si) or silicon-on-insulator (SOI)
substrates is of great interest for photonics and electronics applications. In this work …

Coalescence of GaP on V-Groove Si Substrates

TE Saenz, JS Mangum, OD Schneble… - ACS Applied …, 2023 - ACS Publications
Here, we study the morphology and dislocation dynamics of metalorganic vapor phase
epitaxy (MOVPE)-grown GaP on a V-groove Si substrate. We show that Si from the substrate …

[HTML][HTML] Defect free strain relaxation of microcrystals on mesoporous patterned silicon

A Heintz, B Ilahi, A Pofelski, G Botton… - Nature …, 2022 - nature.com
A perfectly compliant substrate would allow the monolithic integration of high-quality
semiconductor materials such as Ge and III-V on Silicon (Si) substrate, enabling novel …

[HTML][HTML] Catalysis-Free Growth of III-V Core-Shell Nanowires on p-Si for Efficient Heterojunction Solar Cells with Optimized Window Layer

SB Kang, R Sharma, M Jo, SI Kim, J Hwang, SH Won… - Energies, 2022 - mdpi.com
The growth of high-quality compound semiconductor materials on silicon substrates has
long been studied to overcome the high price of compound semiconductor substrates. In this …