The improved performance of the semiconductor microprocessors was achieved for several
decades by continuous scaling of the device dimensions while using the same materials for …

This paper is based on the 2015 AVS John A. Thornton Memorial Award Lecture. In 2015,
the semiconductor industry celebrated the 50th anniversary of Moore's law, which has been …

PRAM (Parallel Random Access Model) has been widely regarded a desirable parallel
machine model for many years, but it is also believed to be" impossible in reality." As the …

A single precursor, octamethylcyclotetrasiloxane (OMCTS), was used to develop a pSiCOH
interconnect dielectric with an ultralow dielectric constant k ¼2. 4. With no added porogen …

This chapter covers integration, performance, and three main process sectors concerning
back-end-of-line (BEOL) wiring (“interconnect”) process technology: intralevel dielectrics …

The semiconductor industry has been improving the performance of ultra-large-scale
integrated (ULSI) circuits by shrinking the transistor size according to Moore's Law, which …

The main problems and distinctive features in developing CMOS VLSI technology are
considered for a decrease in the node size to 0.18 μm or less. This becomes possible on the …

With the end of exponential performance improvements in sequential computers, parallel
computers, dubbed" chip multiprocessor"," multicore", or" manycore", has been introduced …

As device sizes decrease and device densities increase, chip performance will begin to
erode without modified materials. This is a significant problem for the semiconductor industry …

It is shown by experiment that a directed atomic-hydrogen stream offers a means of residual-
photoresist removal from Si and GaAs surfaces. The dependence of postprocess surface …