[HTML][HTML] Indium arsenide quantum dots: An alternative to lead-based infrared emitting nanomaterials

HB Jalali, L De Trizio, L Manna… - Chemical Society Reviews, 2022 - pubs.rsc.org
Colloidal quantum dots (QDs) emitting in the infrared (IR) are promising building blocks for
numerous photonic, optoelectronic and biomedical applications owing to their low-cost …

Growth by molecular beam epitaxy and characterization of InAs/GaAs strained‐layer superlattices

L Goldstein, F Glas, JY Marzin, MN Charasse… - Applied Physics …, 1985 - pubs.aip.org
InAs/GaAs superlattices with ultra-thin InAs (few monolayer) were grown on GaAs
substrates. Nucleation of InAs occurs in a two-dimensional or a three-dimensional way …

Indium arsenide: a semiconductor for high speed and electro-optical devices

AG Milnes, AY Polyakov - Materials Science and Engineering: B, 1993 - Elsevier
Indium arsenide is a direct gap semiconductor (0.36 eV at 300 K and 0.40 eV at 77 K) with
high electron mobility (greater than 20 000 cm 2 Vt-1 s− 1 at 300 K and approximately 60 …

First stages of the MBE growth of InAs on (001) GaAs

F Houzay, C Guille, JM Moison, P Henoc… - Journal of Crystal growth, 1987 - Elsevier
We report the investigation of the early stages (0–15 monolayers) of the InAs MBE growth on
(001) GaAs under As-stabilized growth conditions using surface techniques and …

On the practical applications of MBE surface phase diagrams

SM Newstead, RAA Kubiak, EHC Parker - Journal of Crystal Growth, 1987 - Elsevier
This paper reports detailed surface phase diagrams for (100) GaAs and (100) InAs. In the
case of GaAs, growth rates from 0.07 to 3.0 μm/h, As 4: Ga flux ratios from 0.25: 1 to 100: 1 …

Infrared reflection and transmission of undoped and Si-doped InAs grown on GaAs by molecular beam epitaxy

YB Li, RA Stradling, T Knight, JR Birch… - Semiconductor …, 1993 - iopscience.iop.org
Nondestructive optical methods, based on measurements of the'plasma edge'and the Moss-
Burstein shift, are investigated as contactless alternatives to Hall measurements for …

Electrical and magneto-optical of MBE InAs on GaAs

PD Wang, SN Holmes, T Le, RA Stradling… - Semiconductor …, 1992 - iopscience.iop.org
The electrical quality of InAs films grown on GaAs substrates by MBE is found to be optimum
for growth temperatures close to 490 degrees C. The Hall mobility for such samples is 80000 …

Carbon incorporation in (AlGa) As,(AlIn) As and (GaIn) As ternary alloys grown by molecular beam epitaxy

HIH Ito, TIT Ishibashi - Japanese journal of applied physics, 1991 - iopscience.iop.org
Carbon incorporation in III-V ternary alloys,(AlGa) As,(AlIn) As and (GaIn) As, for the entire
composition range is investigated using solid-source molecular beam epitaxy. On the binary …

Optimized InAlAs graded buffer and tensile-strained dislocation filter layer for high quality InAs photodetector grown on Si

G Ryu, S Woo, SS Kang, RJ Chu, JH Han… - Applied Physics …, 2020 - pubs.aip.org
We demonstrate a low threading dislocation density (TDD) and smooth surface InAs layer
epitaxially grown on Si by suppressing phase separation of In x Al 1− x As (x= 0 to 1) graded …

Growth of InxGa1− xAs on GaAs (001) by molecular beam epitaxy

DI Westwood, DA Woolf, RH Williams - Journal of crystal growth, 1989 - Elsevier
As a precursor to investigating the growth of In x Ga 1− x As on Si, a series of 2.8±0.2 μ m
thick films of various compositions (x= 0, 0.13, 0.56 and 1.0) have been deposited by …