Plasma ignition delays were observed in a'main'inductively coupled plasma (ICP), in tandem
with an'auxiliary'ICP. The Faraday-shielded ICPs were separated by a grounded metal grid …

A potential source of particle contamination due to poorly maintained PECVD chamber
condition forces to perform in situ dry cleaning also actively employed before the wet …

The mechanism of highly selective etching by a pulsed-microwave electron-cyclotron-
resonance plasma was investigated by analyzing surface-reaction layers formed on …

In situ plasma diagnostics present the classical problem of the scientific measurement: how
does one accurately measure a system without also perturbing it? The uncertainty in the …

In plasma materials processing, such as plasma etching, control of the time-averaged
electron energy distributions (EEDs) in the plasma allows for control of the time-averaged …

The mechanism of highly selective etching of SiO 2 using pulsed-microwave electron-
cyclotron-resonance plasma was investigated by analyzing the relationship between plasma …

Using CH 3 F/O 2/He based chemistries in high density plasmas for silicon nitride spacer
etching, loss of silicon in active source/drain regions of CMOS transistors can be observed …

A retarding field energy analyzer (RFEA) is used to measure the time-averaged ion energy
distributions (IEDs) on the substrate in both continuous wave (CW) and synchronous pulse …

The electron density, ne, modulation is measured experimentally using a resonance hairpin
probe in a pulsed, dual-frequency (2/13.56 MHz), dual-antenna, inductively coupled plasma …

Crisis in coronavirus times requires understanding the effects on society and establishing
efficient mechanisms to prevent infections. The disinfection of personal protection equipment …