Evaluation of cracking efficiency of As and P precursors

D Ritter, H Heinecke - Journal of crystal growth, 1997 - Elsevier
The cracking behaviour of PH3, TBP and DitBuPH, AsH3 and TBAs was studied by mass
spectrometry in a production-type MOMBE growth chamber. The measurements were …

Control of residual impurity incorporation in tertiarybutylarsine-grown GaAs

G Haacke, SP Watkins, H Buckhard - Journal of crystal growth, 1991 - Elsevier
Metalorganic chemical vapor deposition was used to grow unintentionally doped GaAs
epitaxial layers and compare the properties of arsine-and tertiarybutylarsine-grown layers …

In-situ formation of As-H functions by β-elimination of specific metalorganic arsenic compounds for the MOVPE of III/V semiconductors

G Zimmermann, H Protzmann, W Stolz, EO Göbel… - Journal of crystal …, 1992 - Elsevier
We report on the chemical synthesis, thermal decomposition studies and the first low
pressure MOVPE growth experiments for a new class of metalorganic As compounds …

GaAs pin photodiodes made by metalorganic chemical vapor deposition using tertiarybutylarsine and arsine

HB Serreze, JA Baumann, L Bunz, R Schachter… - Applied physics …, 1989 - pubs.aip.org
High‐speed, 80‐μm‐diam, GaAs/Al x Ga1− x As p‐i‐n photodiodes having frequency
response in excess of 7 GHz and internal quantum efficiency approaching 100% were …

Doping and residual impurities in GaAs layers grown by close‐spaced vapor transport

C Le Bel, D Cossement, JP Dodelet… - Journal of applied …, 1993 - pubs.aip.org
The close-spaced vapor transport (CSVT) technique is used to grow GaAs epitaxial layers
from various n-or p-type doped GaAs sources. The transport agent is H, O with PHzo= 4.58 …

Epitaxial growth of n+n GaAs metal‐semiconductor field‐effect transistor structures using tertiarybutylarsine

RM Lum, JK Klingert, F Ren, NJ Shah - Applied physics letters, 1990 - pubs.aip.org
We report the first demonstration of metal‐semiconductor field‐effect transistors (MESFETs)
made from GaAs structures grown with an alkylarsine source, tertiarybutylarsine (t‐BuAsH2) …

Ftir Studies Of Organometallic Surface Chemistry Relevant To Atomic Layer Epitaxy.

AV Annapragada, S Salim, KF Jensen - MRS Online Proceedings Library, 1991 - Springer
The adsorption and surface reactions of trimethylgallium and tertiarybutylarsine on GaAs
(100) surfaces have been investigated by Fourier transform infrared spectroscopy. Adsorbed …

An analysis of the two electron satellite spectrum of GaAs in high magnetic fields

F Driessen, HGM Lochs, SM Olsthoorn… - Journal of applied …, 1991 - pubs.aip.org
We report the observation of 2 p 0,− 1, 2 s 0, 3 d− 1,− 2, 3 p− 1, and 4 f− 3 structures in the
''two electron''satellite photoluminescence of excitons bound to the (hydrogenic) shallow …

Use of tertiarybutylarsine in the fabrication of GaAs/AlGaAs quantum wells and quantum well lasers

SG Hummel, CA Beyler, Y Zou, P Grodzinski… - Applied physics …, 1990 - pubs.aip.org
Tertiarybutylarsine was used in the growth of GaAs and AIGaAs by metalorganic chemical
vapor deposition over a range of compositions and V IIIl ratios. GaAs layers were obtained …

Kinetic model for metal-organic chemical vapor deposition of gallium arsenide with organometallic-arsenic precursors

TR Omstead, KF Jensen - Chemistry of Materials, 1990 - ACS Publications
Models for the chemical kinetics of the growth of GaAs by using triethylgallium and
trimethylgallium with trimethylarsene, triethylarsene, tert-butylarsine, and phenylarsine are …