Exploring the performance of 3-D nanosheet FET in inversion and junctionless modes: Device and circuit-level analysis and comparison

VB Sreenivasulu, NA Kumari, SR Kola, J Singh… - IEEE Access, 2023 - ieeexplore.ieee.org
In this article, the performance of 3-D nanosheet FET (NS-FET) in inversion (INV) and
junctionless (JL) modes is demonstrated and compared at both device and circuit levels. In …

Leakage and Thermal Reliability Optimization of Stacked Nanosheet Field-Effect Transistors with SiC Layers

C Li, Y Shao, F Kuang, F Liu, Y Wang, X Li, Y Zhuang - Micromachines, 2024 - mdpi.com
In this work, we propose a SiC-NSFET structure that uses a PTS scheme only under the
gate, with SiC layers under the source and drain, to improve the leakage current and thermal …

Novel partial punch-through-stopper scheme for substrate leakage optimization of nanosheet field-effect transistors

H Luo, Y Li, F Zhao, JY Zhang, Y Li - Microelectronics Journal, 2024 - Elsevier
A novel and practicable partial punch-through-stopper (p-PTS) scheme beneath the gate
area is proposed for the substrate leakage current suppression in the gate-all-around (GAA) …

Impacts of Asymmetry Double Gate Structure on Reliability Degradation of Thin-Film Transistor With Nanosheet Channel

WCY Ma, CJ Su, KH Kao, TC Cho… - … Workshop on Active …, 2023 - ieeexplore.ieee.org
This work investigates the characteristics and reliability of double-gate (DG) and single-gate
(SG) mode operations in polycrystalline-silicon nanosheet transistors (TFTs). It is observed …

Enhancement of SiO2 Uniformity by High-Pressure Deuterium Annealing

YS Kim, DH Jung, HJ Park, JW Yeon… - Journal of the Korean …, 2024 - koreascience.kr
As complementary metal-oxide semiconductor (CMOS) is scaled down to achieve higher
chip density, thin-film layers have been deposited iteratively. The poor film uniformity …