Fabrication of low-loss III-V Bragg-reflection waveguides for parametric down-conversion

H Thiel, M Wagner, B Nardi, A Schlager… - Optical Materials …, 2023 - opg.optica.org
Entangled photon pairs are an important resource for many types of quantum protocols.
Semiconductor Bragg-reflection waveguides are a promising photon-pair source due to …

Enhanced absorption of infrared light for quantum wells in coupled pillar-cavity arrays

J Xin-Yang, L Wei-Wei, L Tian-Xin, X Hui, D Wei-Jie… - Optics …, 2023 - opg.optica.org
Periodic pillars of semiconductor in sub-wavelength size can serve multiple roles as
diffracting, trapping and absorbing light for effective photoelectric conversion which has …

Advanced and reliable GaAs/AlGaAs ICP-DRIE etching for optoelectronic, microelectronic and microsystem applications

PB Vigneron, F Joint, N Isac, R Colombelli… - Microelectronic …, 2018 - Elsevier
We investigate the parameter optimization for micron-scale etching by Inductive Coupled
Plasma-Deep Reactive Ion Etching (ICP-DRIE) of GaAs/AlGaAs semiconductor …

Atomic layer etching of GaN and other III-V materials

W Yang, T Ohba, S Tan, KJ Kanarik, J Marks… - US Patent …, 2018 - Google Patents
Provided herein are ALE methods of removing III-V materials such as gallium nitride (GaN)
and related apparatus. In some embodiments, the methods involve exposing the III-V …

[HTML][HTML] Kinetic influences on void formation in epitaxially regrown GaAs-based PCSELs

AF McKenzie, AM Kyaw, ND Gerrard… - Journal of Crystal …, 2023 - Elsevier
We report an investigation into the formation of crystallographic voids during the
metalorganic vapour phase epitaxial regrowth of GaAs photonic crystal structures. We …

Towards universal plasma-enabled platform for the advanced nanofabrication: Plasma physics level approach

O Baranov, S Xu, K Ostrikov, BB Wang… - Reviews of Modern …, 2018 - Springer
Growing demand for efficient, high-resolution surface processing has led to the emergence
of a rich variety of plasma-based technologies underpinned by an equally wide range of …

Designer atomic layer etching

KJ Kanarik - US Patent 10,566,212, 2020 - Google Patents
Methods for evaluating synergy of modification and removal operations for a wide variety of
materials to determine process conditions for self-limiting etching by atomic layer etching are …

Tuneable four-wave mixing in AlGaAs nanowires

K Dolgaleva, P Sarrafi, P Kultavewuti, KM Awan… - Optics express, 2015 - opg.optica.org
We have experimentally demonstrated broadband tuneable four-wave mixing in AlGaAs
nanowires with the widths ranging between 400 and 650 nm and lengths from 0 to 2 mm …

Large-scale monolithic fabrication of III–V vertical nanowires on a standard Si (100) microelectronic substrate

A Lecestre, M Martin, F Cristiano, T Baron… - ACS omega, 2022 - ACS Publications
Vertical III–V nanowires are of great interest for a large number of applications, but their
integration still suffers from manufacturing difficulties of these one-dimensional …

Optical frequency conversion in integrated devices

L Caspani, D Duchesne, K Dolgaleva, SJ Wagner… - JOSA B, 2011 - opg.optica.org
We review our recent progress on frequency conversion in integrated devices, focusing
primarily on experiments based on strip-loaded and quantum-well intermixed AlGaAs …