The gold standard of microfluidic fabrication techniques, SU-8 patterning, requires photolithography equipment and facilities and is not suitable for 3D microfluidics. A 3D …
K Guilloy, N Pauc, A Gassenq, V Calvo - MRS Advances, 2016 - Springer
We present here a reactive ion etching recipe to fabricate germanium nanowires. We used a combination of Cl 2, N 2 and O 2 and studied the influence of both the gas pressure and the …
M Barrow, S Wright, S Puzycki, P Shah… - Journal of Vacuum …, 2021 - pubs.aip.org
Selective etching of GaAs is critical for many applications, including flat optical components and high electron mobility transistors. It is long-known that F-containing process gases …
S Uchida, N Ozaki, T Nakahama, H Oda… - Japanese Journal of …, 2017 - iopscience.iop.org
We herein propose and verify an ultra-small near-infrared (NIR) multi-wavelength light source using a heterojunction photonic crystal waveguide (PC-WG) and quantum dots …
A Larrue, D Belharet, P Dubreuil, S Bonnefont… - Journal of Vacuum …, 2011 - pubs.aip.org
Planar two-dimensional photonic crystals are key tools for the development of advanced optoelectronic devices. However, their practical realization often requires deep etching of air …
U Peralagu, X Li, O Ignatova, YC Fu, DAJ Millar… - ECS …, 2015 - iopscience.iop.org
Based on current projections, III-Vs are expected to replace Si as the n-channel solution in FinFETs at the 7nm technology node. The realisation of III-V FinFETs entails top-down …
Interfacing stationary matter qubits with flying photonic qubits is of major interest in quantum computing and quantum communication technology as it is a necessary requirement to …