A dielectric barrier discharge (DBD) in atmospheric pressure air was excited by a high-
voltage pulse power supply. Capacitors with different capacitance were connected in the …

Electronegative inductively coupled plasmas (ICPs) are used for conductor etching in the
microelectronics industry for semiconductor fabrication. Pulsing of the antenna power and …

Numerical and analytical approaches to plasma density determination from the ion current to
cylindrical Langmuir probe are validated on hairpin probe measurements. An argon …

In this work, an improved understanding of electron sheath theory is provided using both
fluid and kinetic approaches while elaborating on their implications for plasma–surface …

In this letter, temporal evolution of plasma density is characterized in the time-domain using
a low-power THz frequency-comb radiator in the 130-nm SiGe BiCMOS process. The …

Hairpin probes are used to determine electron densities via measuring the shift of the
resonant frequency of the probe structure when immersed in a plasma. This manuscript …

Plasma etching is an essential semiconductor manufacturing technology required to enable
the current microelectronics industry. Along with lithographic patterning, thin-film formation …

Pulse inductively coupled plasma has been widely used in the microelectronics industry, but
the existence of overshoot phenomenon may affect the uniformity of plasma and generate …

A pulsed RF discharge is considered experimentally as a working process of an RF ion
source. It is shown that an increase in the ion current can be obtained in comparison with the …

The paper describes an experimental study of the characteristics of a pulse-modulated radio-
frequency (RF) discharge sustained at low pressures, typical of the operating modes of RF …