Optical parameters of InP-based waveguides

F Fiedler, A Schlachetzki - Solid-state electronics, 1987 - Elsevier
The quaternary alloys InGaAsP, matched in their lattice constant to InP, are considered in
view of optical-waveguide applications. The parameters, most important in this connexion …

3 Diffusion in compound semiconductors

MB Dutt, BL Sharma - Diffusion in Semiconductors, 1998 - Springer
3 Diffusion in compound semiconductors, pp. 1-63 Page 1 Ref. p. 3-70] 3 Diffusion in compound
semiconductors Landolt-B{rnstein New Series III/33A 3-1 3 Diffusion in compound …

Double zinc diffusion fronts in inp: correlation with models of varying charge transfer during interstitial-substitutional interchange

K Kazmierski, B de Cremoux - Japanese journal of applied …, 1985 - iopscience.iop.org
Double Zinc Diffusion Fronts in InP: Correlation with Models of Varying Charge Transfer
during Interstitial-Substitutional Interchange - IOPscience Skip to content IOP Science home …

[PDF][PDF] Исследование диффузии цинка в фосфид индия и гетероэпитаксиальные структуры n- InP/ n- In 0.53 Ga 0.47 As/ n +- InP

ДС Андреев, ПЕ Хакуашев… - Успехи прикладной …, 2013 - advance.orion-ir.ru
Диффузия в гетероэпитаксиальные структуры n-InP/n-In0. 53Ga0. 47As/n+-InP является
одной из ключевых операций для формирования p–n-перехода при изготовлении …

Diffusion from SiO2: Zn spin-on films into n-In0. 53Ga0. 47As

H Albrecht, C Lauterbach - Japanese journal of applied physics, 1986 - iopscience.iop.org
Abstract Zn-diffusion from SiO 2: Zn spin-on films into n-InGaAs for the preparation of pn
junctions has been investigated. The measured pn junction depths versus diffusion time are …

InGaAs shallow junction fabrication using Langmuir–Blodgett film diffusion source

DM Shah, WK Chan, R Bhat, HM Cox… - Applied physics …, 1990 - pubs.aip.org
A new source of cadmium diffusion in In0. 53Ga0. 47As has been developed. Langmuir–
Blodgett (LB) deposited monolayers of cadmium arachidate have been used as a source of …

[PDF][PDF] Изучение процесса диффузии цинка в InP и в гетероструктуры InP/In 0.53Ga 0.47As/InP применительно к p ─ i ─ n-фотодиодам

ДС Андреев, НБ Залетаев, ПЕ Хакуашев… - Прикладная …, 2013 - applphys.orion-ir.ru
77 Прикладная физика, 2013, № 6 т. е. поверхность становится нестехиометричной. В
InP n-типа увеличивается концентрация акцепторов, которыми являются вакансии …

Copper-related defects in As grown by liquid-phase epitaxy

LP Tilly, HG Grimmeiss, PO Hansson - Physical Review B, 1993 - APS
Abstract High-purity In 0.53 Ga 0.47 As lattice matched to InP was grown by liquid-phase
epitaxy and used for the study of Cu-related defects. The samples had a free-electron carrier …

Thin-source concentration-dependent diffusion: A full solution

G Eng - Physical Review B, 1989 - APS
A new method of analysis is developed for solving the problem of an initially thin source of
impurity ions diffusing into a host solid when the mechanism of transport involves a …

Diffusion mechanism of Cd in InP and InGaAs

K Ohtsuka, T Matsui, H Ogata - Japanese journal of applied …, 1988 - iopscience.iop.org
Cadmium was diffused into InP and InGaAs using Cd 3 P 2+ P or Cd 3 P 2+ Cd 3 As 2 as the
diffusion sources. Two diffusion fronts were observed. The diffusion characteristics for Cd 3 …