F Kuang, C Li, H Li, H You, MJ Deen - Electronics, 2023 - mdpi.com
In this article, the effects of non-ideal cross-sectional shapes of stacked nanosheet FET (NSFET) and nanosheet FET with inter-bridge channel (TreeFET) are studied through …
D Wang, T Liu, X Sun, Z Huang, L Qian… - … on Electron Devices, 2024 - ieeexplore.ieee.org
In this work, a novel self-aligned source/drain confinement (SA-SDC) scheme is proposed to enable the downsizing of gate-all-around (GAA) nanosheet (NS) field-effect transistors …
L Li, L Cao, X Zhang, Q Li, M Zhang, Z Wu… - ECS Journal of Solid …, 2024 - iopscience.iop.org
We propose a novel silicon-on-nothing (SON) structure with an air sub-fin for suppressing the parasitic channel effects on stacked Si nanosheets (NS) gate-all-around (GAA) …
Using FD-SOI (fully-depleted silicon-oninsulator) device structure for gate-all-around FET (GAAFET), the device performance of the GAAFET can be improved. For the GAAFET, the …