Analysis of Electromagnetic Interference Effect on Semiconductor Scanning Electron Microscope Image Distortion
YJ Park, R Pan, DC Montgomery - Applied Sciences, 2023 - mdpi.com
Most electronic devices are susceptible to electromagnetic interference (EMI); thus, it is
necessary to recognize and identify the cause and effect of EMI as it can corrupt electronic …
necessary to recognize and identify the cause and effect of EMI as it can corrupt electronic …
The rise of contour metrology from niche solution to versatile enabler
N Schuch, F Robert, T Figueiro - Metrology, Inspection, and …, 2023 - spiedigitallibrary.org
The concept of using contours from SEM images for improving metrology results on
semiconductor manufacturing applications exists for almost over two decades. However, the …
semiconductor manufacturing applications exists for almost over two decades. However, the …
Model-based contour extraction: an enabler for very low-frame SEM images metrology
É Sezestre, J Scoarnec, J Pradelles… - Metrology …, 2022 - spiedigitallibrary.org
Among metrology tools in the semi-conductor manufacturing, critical dimension scanning
electron microscopes (CD-SEM) are the most broadly used, especially due to their high …
electron microscopes (CD-SEM) are the most broadly used, especially due to their high …
Can remote SEM contours be used to match various SEM tools in fabs?
J Pradelles, L Perraud, E Sezestre… - Metrology …, 2023 - spiedigitallibrary.org
CD-SEM is one of the workhorse metrology tools for evaluating the patterning performances
in the semiconductor industry. With the continuous shrink of device feature sizes …
in the semiconductor industry. With the continuous shrink of device feature sizes …