Low-temperature plasma-processing technologies are essential for material synthesis and
device fabrication. Not only the utilization but also the development of plasma-related …

Low-temperature plasmas (LTPs) are essential to manufacturing devices in the
semiconductor industry, from creating extreme ultraviolet photons used in the most …

Plasma etching effects, such as microtrenching and bowing, negatively impact device
performance. Modeling of these effects at nanoscale is challenging, and theoretical and …

This study modeled deposition processes using statistical ensemble and feature-scale voxel
methods to predict the coverage and film properties on a large-scale pattern for the first time …

The etching characteristics were studied via time-modulation bias (bias pulsing) by varying
the pulsing parameters. The etch profiles were verified using polysilicon gate structures with …

Atomic layer etching of Si is reported in a radio frequency (RF) pulsed-power inductively
coupled (ICP) plasma, with periodic injections of HBr into a continuous He/Ar carrier gas …

Modeling and simulation of feature scale profiles, including damage distributions and film
properties in dry etching (continuous wave, pulse, cycle, and atomic layer etching) and …

Plasma etching is an essential semiconductor manufacturing technology required to enable
the current microelectronics industry. Along with lithographic patterning, thin-film formation …

In plasma etching for microelectronics fabrication, one of the objectives is to produce high
aspect ratio (HAR) via and trench structures. A principal contributor to the HAR feature …