Defect energy levels in p-type GaAsBi and GaAs grown by MBE at low temperatures

PM Mooney, MC Tarun, V Bahrami-Yekta… - Semiconductor …, 2016 - iopscience.iop.org
Deep level defects in p-type GaAs 1− x Bi x (x< 1%) and GaAs grown by molecular beam
epitaxy at substrate temperatures of 330 C and 370 C have been characterized by deep …

Optically induced charging effects in self-assembled quantum dots

M Hayne, O Razinkova, S Bersier, R Heitz… - Physical Review B …, 2004 - APS
We report photoluminescence (PL) measurements on self-assembled Ga Sb∕ Ga As
quantum dots. As the laser excitation is increased from very low levels, the PL shows a …

III–V compound semiconductor multi-junction solar cells fabricated by room-Temperature wafer-bonding technique

M Arimochi, T Watanabe, H Yoshida… - Japanese Journal of …, 2015 - iopscience.iop.org
We have developed III–V compound semiconductor multi-junction solar cells by a room-
temperature wafer-bonding technique to avoid the formation of dislocations and voids due to …

2×106 cm2/V s electron mobility by metalorganic chemical vapor deposition with tertiarybutylarsine

HC Chui, BE Hammons, NE Harff, JA Simmons… - Applied physics …, 1996 - pubs.aip.org
We demonstrate the metalorganic chemical vapor deposition (MOCVD) growth of two‐
dimensional electron gases (2DEGs) with electron mobilities up to 2.0× 106 cm2/V s at 0.3 …

Intrinsic carbon incorporation in very high purity MOVPE GaAs

MC Hanna, ZH Lu, EG Oh, E Mao, A Majerfeld - Journal of crystal growth, 1992 - Elsevier
The limits of intrinsic carbon incorporation in very high purity GaAs grown by atmospheric
pressure metalorganic vapor phase epitaxy (MOVPE) were investigated by using a MOVPE …

Residual donor and acceptor incorporation in InP grown using trimethylindium and tertiarybutylphosphine

SP Watkins, MK Nissen, G Haacke… - Journal of applied …, 1992 - pubs.aip.org
Residual donor and acceptor species were studied in a series of high purity n‐type InP
epilayers grown by metalorganic chemical vapor deposition using tertiarybutylphosphine …

OMVPE growth and characterization of AlxGa1− xP (0≤ x≤ 1) using tertiarybutylphosphine

XL Wang, A Wakahara, A Sasaki - Journal of crystal growth, 1993 - Elsevier
Al x Ga 1− x P (0≤ x≤ 1) epilayers are grown by OMVPE using TBP as a phosphorus
source. GaP epilayers with a specular surface are obtained at growth temperatures higher …

Comparative study on carbon incorporation in MOCVD AlGaAs layers between arsine and tertiarybutylarsine

M Mashita, H Ishikawa, T Izumiya - Journal of crystal growth, 1995 - Elsevier
We have studied the carbon incorporation properties in MOCVD Al0. 7Ga0. 3As epilayers on
differently oriented surfaces by using either arsine or tertiarybutylarsine (TBAs). The present …

Study of the gas phase chemistry in the silicon doping of GaAs grown by metalorganic vapor phase epitaxy using tertiarybutylarsine as the Group V source

JM Redwing, TF Kuech, D Saulys, DF Gaines - Journal of crystal growth, 1994 - Elsevier
Gas phase decomposition studies have been combined with metalorganic vapor phase
epitaxy (MOVPE) growth and doping experiments to investigate the mechanism behind the …

OMVPE growth of InAsSb using novel precursors

KT Huang, Y Hsu, RM Cohen, GB Stringfellow - Journal of crystal growth, 1995 - Elsevier
InAs, InSb, InAsSb and the related bismuth containing alloys are useful materials for infrared
applications. A significant effort has been expended to develop new group III and group V …