As semiconductor devices become miniaturized, the importance of the molecular-level
understanding of the fabrication processes is growing. Titanium nitride (TiN) is an important …

Microwave loss in superconducting TiN films is attributed to two-level systems in various
interfaces arising in part from oxidation and microfabrication-induced damage. Atomic layer …

Thermal atomic layer etching (ALE) is a promising method for isotropic etching with atomic
level precision and high conformality over three-dimensional structures. In this study, a …

Plasma etching is an essential semiconductor manufacturing technology required to enable
the current microelectronics industry. Along with lithographic patterning, thin-film formation …

In this paper, atomic layer etching (ALE) processes for SiO 2 are reviewed and categorized
into two distinct group of anisotropic and isotropic ALE processes. Anisotropic ALE typically …