摘要波片相位延迟量误差, 快轴角度误差和检偏器透光轴角度误差是影响基于旋转波片法的偏振
检测装置测量精度的主要因素. 通过对波片和检偏器参数进行校准, 可有效提高检测装置测量 …

For immersion lithography with aggressive polarization illumination settings, it is important to
newly construct two systems for diagnosing lithography tools; Stokes polarimetry of …

A waveplate is usually used to measure the polarization effects in optical systems. For a
hyper numerical aperture imaging system with a large angle of incidence, the incident plane …

It will be required for more accurate lithography simulation of complicated mask patterns
then ever, under hyper-NA (numerical aperture) projection lens and aggressive small …

摘要波片通常用于测量光学系统的偏振效应. 对于大入射角的超高数值孔径(NA) 成像系统,
待测光不再平行于系统光轴, 而是与系统光轴有较大夹角的圆锥形光束, 所以在高NA …

Dual-rotating compensator Mueller matrix ellipsometer (DRC-MME) has been designed and
applied as a powerful tool for the characterization of thin films and nanostructures. The …

Double-pass polarimetry measures the polarization properties of a sample over a range of
polar angles and all azimuths. Here, we present a tolerance analysis of all the optical …