Creating inorganic nanostructures for development of nanoelectronic device components is
a highly active research area. The ability for manipulation of the chemistry of materials, as …

The present paper describes the sub-10 nm scale self-assembly of AB-type diblock, ABA-
type triblock, and A2B-type miktoarm star copolymers consisting of maltoheptaose (MH: A …

The directed self-assembly (DSA) of block co-polymers (BCPs) can realize next-generation
lithography for semiconductors and a variety of soft materials. It is imperative to …

Directed self-assembly of block copolymers (BCP) is a very attractive technique for the
realization of functional nanostructures at high resolution. In this work, we developed full dry …

We report a remarkable sensitivity of self-assembled structures of giant surfactants on their
chemical compositions and molecular topology, which facilitate the engineering of various …

We report a combined directing effect of the simultaneously applied graphoepitaxy and
electric field on the self-assembly of cylinder forming polystyrene-b-poly (dimethylsiloxane) …

Solvothermal vapor annealing (STVA) was employed to induce microphase separation in a
lamellar forming block copolymer (BCP) thin film containing a readily degradable block …

The continuous demand for small portable electronics is pushing the semiconductor industry
to develop novel lithographic methods to fabricate the elementary structures for …

The directed self-assembly (DSA) of block copolymers (BCPs) is a powerful method for the
manufacture of high-resolution features. Critical issues remain to be addressed for …

We leverage the attractive properties of a high χ–low N BCP, ie, poly (styrene)-block-poly (2-
fluoroethylmethyl acrylate)(PS-b-P2FEMA), and illustrate its utility for next-generation …