[HTML][HTML] Review on III-V semiconductor single nanowire-based room temperature infrared photodetectors

Z Li, J Allen, M Allen, HH Tan, C Jagadish, L Fu - Materials, 2020 - mdpi.com
Recently, III-V semiconductor nanowires have been widely explored as promising
candidates for high-performance photodetectors due to their one-dimensional morphology …

Band-selective infrared photodetectors with complete-composition-range InAs (x) P (1-x) alloy nanowires.

P Ren, W Hu, Q Zhang, X Zhu, X Zhuang… - … (Deerfield Beach, Fla …, 2014 - europepmc.org
Band-selective infrared photodetectors (PDs) are constructed with InAs (x) P (1-x) alloy
nanowires from the complete composition range (0≤ x≤ 1) achieved by a new growth route …

Optoelectronic properties of semiconductor nanowires

A Pan, X Zhu - Semiconductor Nanowires, 2015 - Elsevier
In this chapter, optoelectronic properties of semiconductor nanowires, the fundament of the
nanowire optoelectronic devices, will be analyzed. This chapter focuses on the …

Photoluminescence lineshape and dynamics of localized excitonic transitions in InAsP epitaxial layers

TR Merritt, MA Meeker, BA Magill… - Journal of Applied …, 2014 - pubs.aip.org
The excitonic radiative transitions of InAs x P 1− x (x= 0.13 and x= 0.40) alloy epitaxial layers
were studied through magnetic field and temperature dependent photoluminescence and …

Optical property of InAsP/InP strained quantum wells grown on InP (111) B and (100) substrates

HQ Hou, CW Tu - Journal of applied physics, 1994 - pubs.aip.org
InAsP/InP strained multiple quantum wells (MQWs) were grown on InP (111) B and (100)
substrates by gas-source molecular-beam epitaxy. Specular surfaces were obtained under …

[图书][B] InP and related compounds: materials, applications and devices

MO Manasreh - 2000 - taylorfrancis.com
InP is a key semiconductor for the production of optoelectronic and photonic devices. Its
related compounds, such as InGaAsP alloy, have been realized as very important materials …

Carrier compensation and scattering mechanisms in Si-doped InAsyP1− y layers grown on InP substrates using intermediate InAsyP1− y step-graded buffers

MK Hudait, Y Lin, PM Sinha, JR Lindemuth… - Journal of applied …, 2006 - pubs.aip.org
Electronic transport properties of strain-relaxed Si-doped In As y P 1− y layers with arsenic
mole fractions between y= 0.05 and y= 0.50 were studied. All layers were grown on semi …

Monolayer abruptness in highly strained InAsxP1−x/InP quantum well interfaces

RP Schneider Jr, BW Wessels - Applied physics letters, 1989 - pubs.aip.org
InAs x P1− x/InP strained quantum well structures have been prepared by atmospheric‐
pressure organometallic vapor phase epitaxy (OMVPE). Structures with compositions of x …

Growth and properties of InAsP alloys prepared by organometallic vapor phase epitaxy

KH Huang, BW Wessels - Journal of crystal growth, 1988 - Elsevier
InAs x P 1-x with x ranging form 0 to 0.60 has been heteroepitaxially deposited on InP.
Organometallic vapor phase epitaxy was carried out in a horizontal, atmospheric pressure …

Analysis of temperature dependence of electrical conductivity in degenerate n-type polycrystalline InAsP films in an energy-filtering model with potential fluctuations at …

Y Kajikawa, K Okamura, Y Inoko, H Mizuki - Journal of Applied Physics, 2012 - pubs.aip.org
Hall-effect measurements were performed in the temperature range of 10-400 K on
degenerate n-type polycrystalline InAs x P 1− x films deposited on glass substrates by …