Continuous rapid shrinking of feature size made the authorities to seek alternative patterning
methods as the conventional photolithography comes with its intrinsic resolution limit. In this …

Extreme ultraviolet (EUV) lithography is a critical enabler in next-generation technology,
although the low etch resistance of conventional organic EUV resists results in low …

Non-chemically amplified resists (non-CARs) are generally less sensitive to radiation than
CARs due to the lack of an amplification mechanism. Recently, a negative-type non-CAR …

Due to the high energy of extreme ultraviolet (EUV) photons, stochastic effects become more
important at a constant dose when compared with deep ultraviolet exposures. Photoresists …

Background Extreme ultraviolet (EUV) lithography is crucial to achieving smaller device
sizes for next-generation technology, although organic resists face substantial challenges …

Resists are important multicomponent system require in microelectronic industry for
fabrication of integrated circuit (IC) devices. The current high end IC (integrated circuit) …

Resists used for the fabrication of next-generation of semiconductor circuits must exhibit
resolution better than 10 nm and sensitivity comparable to or better than that of chemically …

Irresistible Materials is developing a new molecular resist system that demonstrates high-
resolution capability based on the multi-trigger concept. A series of studies such as resist …

Extreme ultraviolet (EUV) lithography is crucial to achieving smaller device sizes for next-
generation technology, although organic resists face substantial challenges, such as low …

Plasmonic focusing was investigated in concentric rings with a central pillar under linearly
polarized illumination with a specific incident angle. When changing the incident angle of …