Low-temperature plasma-processing technologies are essential for material synthesis and
device fabrication. Not only the utilization but also the development of plasma-related …

A method is demonstrated for controlling the charge of a dust particle in a plasma afterglow,
allowing a wider range of outcomes than an earlier method. As in the earlier method, the …

Particle contamination due to plasma processing motivates the design of a method of
electrically lifting particles in a time interval after a plasma's power is turned off. Small solid …

Capacitively coupled plasmas are routinely used in an increasing number of technological
applications, where a precise control of the flux and energy distribution of ions impacting …

A dust particle immersed in a glow-discharge plasma has long been known to have a
charge that is negative, while the plasma is powered. However, in the afterglow, following …

In this short review, the evolution of plasma etching technologies used in microelectronics
fabrication since the discovery of the reactive ion etching process 50 years ago is explored …

Ion beams generated by a pulsed inductively-coupled (ICP) plasma provides the opportunity
to improve etch selectivity, etch uniformity and minimize the surface damage, which are …