We introduce the new concept of orientation Zernike polynomials, a base function
representation of retardation and diattenuation in close analogy to the wavefront description …

The history of Nikon's projection lens development for optical microlithography started with
the first" Ultra Micro-Nikkor" in 1962, which was used for making photo-masks. Nikon's first …

摘要可靠性是衡量光学仪器检测有效性的一项重要指标, 直接关系到设备的实用性.
研究穆勒成像偏振仪在病理诊断中的可靠性, 对推进其临床应用至关重要 …

The continuous implementation of novel technological advances in optical lithography is
pushing the technology to ever smaller feature sizes. For instance, it is now well recognized …

Polarization remote sensing technology expands the dimensions of the target and enriches
its basic information over traditional remote sensing methods. During the imaging process …

Polarized illumination is a viable technique for improving the image quality and process
latitude of hyper-NA lithography. On investigation of polarization effects, it is often assumed …

The use of immersion technology extends the lifetime of optical lithography by enabling ultra-
high NA much greater than 1.0. Ultra-high NA application for low k 1 imaging strongly …

High-numerical aperture (NA> 0.6) Mueller matrix imaging polarimeter (MMIP)(high-NA
MMIP) is urgently needed for higher resolution. Usually, the working distance of high-NA …

With the continuous shrink of feature sizes the pitch of the mask comes closer to the wave
length of light. It has been recognized that in this case polarization effects of the mask …

Various representations of polarization aberrations are described and compared for optical
lithography. Polarization aberrations, which are potentially important with hyper-numerical …