The inverted horizontal reactor: Growth of uniform InP and GaInAs by LPMOCVD

N Puetz, G Hillier, AJ SpringThorpe - Journal of electronic materials, 1988 - Springer
The uniformity of InP and GalnAs lattice matched to InP has been studied for three different
types of horizontal reactors. Employing the conventional approach, ie the susceptor is …

High performance, long wavelength opto-electronic components by atmospheric pressure MOVPE

AW Nelson, S Cole, S Wong, MJ Harlow… - Journal of Crystal …, 1986 - Elsevier
This paper describes the application of atmospheric pressure MOVPE to the growth of
several long wavelength opto-electronic components including lasers, detectors, field effect …

A study of residual background doping in high purity indium phosphide grown by atmospheric pressure OMVPE

ATR Briggs, BR Butler - Journal of crystal growth, 1987 - Elsevier
High purity InP epilayers have been grown by OMVPE with 77 K mobilities as high as
119000 cm 2 V-1 s-1 using TMIn specially purified via the diphos route. The effect of growth …

Photoluminescence and Raman scattering studies of 2 MeV Yb+‐implanted InP as a function of etching depth

H Katsumata, S Uekusa, H Sai… - Journal of applied physics, 1996 - pubs.aip.org
In ion‐implanted semiconductors, details of the defects involved and annealing mechanisms
which determine the final disorder structure are complicated and difficult to characterize. To …

Photoluminescence investigation of InGaAs‐InP quantum wells

D Moroni, JP Andre, EP Menu, P Gentric… - Journal of applied …, 1987 - pubs.aip.org
The properties of InGaAs-InP single quantum wells have been studied by using the
photoluminescence technique. Samples were grown by atmospheric pressure metalorganic …

Ligand exchange reactions in InGaAs metalorganic vapor-phase epitaxy

MJ Kappers, ML Warddrip, RF Hicks - Journal of crystal growth, 1998 - Elsevier
Metalorganic vapor-phase epitaxy of InyGa1− yAs from triethylgallium, trimethylindium and
tertiarybutylarsine was studied using on-line infrared spectroscopy to monitor the …

Residual acceptor impurities in undoped high‐purity InP grown by metalorganic chemical vapor deposition

SS Bose, I Szafranek, MH Kim, GE Stillman - Applied physics letters, 1990 - pubs.aip.org
Zn and an unidentified acceptor species, labeled A 1, are the only residual acceptors that
have been observed in a wide variety of undoped high‐purity InP samples grown by …

Molecular stream epitaxy of ultrathin InGaAs/GaAsP superlattices

T Katsuyama, MA Tischler, NH Karam… - Applied physics …, 1987 - pubs.aip.org
Molecular stream epitaxy allows several molecular beam epitaxy (MBE) concepts to take
place in a metalorganic chemical vapor deposition reactor. In this technique, the growth of …

Growth of shaped crystals

RS Feigelson - Crystal Growth in Science and Technology, 1989 - Springer
Shaped crystal growth refers to the growth of single crystals with a predetermined cross
sectional configuration designed for a specific application. The quest to develop such …

Technologies Based on Organometallic Vapor Phase Epitaxy

GB Stringfellow - Crystal Growth in Science and Technology, 1989 - Springer
The organometallie vapor phase epitaxy (OMVPE) technique originated from early work of
Manasevit [1]. This technique, by which compound semiconductor epitaxial layers are grown …