3-Dimesional corner residue between Fin and gate bottom plays a key role in gate profile
definition and device performance, while the characterization and compression remain …

Block CoPolymer (BCP) self-assembly creates periodical patterns with feature sizes
eventually below 10 nm. On plain substrates, ordering is only obtained in grains not larger …

An electron cyclotron resonance (ECR) thruster includes a magnetic field source configured
to generate a magnetic field, a thruster body that defines a chamber, the thruster body being …

To assist the development of plasma processes to pattern graphene in a controlled way,
interactions between hydrogen plasma species (H, H?, H2?) and various types of graphene …

Ce travail de thèse aborde le problème de la gravure de matériaux ultraminces pour la
réalisation de nouvelles générations de transistors (FDSOI, FinFET) dans les dispositifs …

The ion energy distributions (IEDs) arriving at a substrate strongly affect the etching rates in
plasma etching processes. In order to determine the IEDs accurately, it is important to obtain …

The aim of this research is to better understand the behaviour of pulsed discharges and
electron dynamics for the purpose of tailoring the plasma properties for neutral beam etching …