Anisotropic plasma-enhanced atomic layer etching (ALE) requires directional ions with a
well-defined ion energy to remove materials in a highly selective and self-limiting fashion. In …

In this paper we have carried out molecular dynamics simulation of the low-energy Ar ion
irradiation of nanoporous homogeneous material with different porosity and pore sizes. Our …

Simulation of non‐self‐sustained plasma generated by a 2‐keV electron beam in Ar with
radiofrequency (RF) biasing is carried out using a one‐dimensional particle‐in‐cell Monte …

Inductively coupled plasma (ICP) argon discharge with additional RF bias on the electrode
is studied numerically and compared with experimental data. The role of ion inertia is shown …

With the purpose to create new methods for monitoring the parameters of low-temperature
nonequilibrium plasma, a numerical drift-diffusion model of an inductive RF discharge in …

In this paper, the authors carried out a molecular dynamics simulation of crystal and
amorphous silicon sputtering by low-energy (200 eV) Ar ions at normal incidence. The …

Organosilicate glass (OSG) nanoporous films with a low dielectric constant (low‐k) are used
as interlayer‐dielectric insulators for advanced interconnects of ultra‐large‐scale integration …

In this work, we present results of a study of low-energy (Е i< 200 eV) sputtering of Co and
Mo nanometer thin films in high-density argon plasma of a low-pressure radio-frequency …

The surface roughness has a huge effect on the mechanical, optical, and electronic
properties of materials. In modern optical systems, the specifications for the surface accuracy …

This paper deals with different mechanisms of the interaction of light and heavy low-energy
ions with nanoporous structures and main structural changes that occur in these structures …