Review on vacuum ultraviolet generation in low‐pressure plasmas
Low‐pressure nonequilibrium plasmas can be a source of intense radiation in the vacuum
ultraviolet (VUV) range which can play an important role in the surface modification of solid …
ultraviolet (VUV) range which can play an important role in the surface modification of solid …
Fundamental study towards a better understanding of low pressure radio-frequency plasmas for industrial applications
YX Liu, QZ Zhang, K Zhao, YR Zhang, F Gao… - Chinese …, 2022 - iopscience.iop.org
Two classic radio-frequency (RF) plasmas, ie, the capacitively and the inductively coupled
plasmas (CCP and ICP), are widely employed in material processing, eg, etching and thin …
plasmas (CCP and ICP), are widely employed in material processing, eg, etching and thin …
Inorganic Low k Cage-molecular Crystals
For the interlayer dielectric in microelectronics, light element compounds are preferably
accepted due to less electronic polarization. Here, the nontrivial dielectric nature of the …
accepted due to less electronic polarization. Here, the nontrivial dielectric nature of the …
Selective Pulsed Chemical Vapor Deposition of Water-Free TiO2/Al2O3 and HfO2/Al2O3 Nanolaminates on Si and SiO2 in Preference to SiCOH
Highly selective and smooth TiO2/Al2O3 and HfO2/Al2O3 nanolaminates were deposited by
water-free pulsed chemical vapor deposition (CVD) at 300° C using titanium isopropoxide …
water-free pulsed chemical vapor deposition (CVD) at 300° C using titanium isopropoxide …
Comprehensive understanding of the ignition process of a pulsed capacitively coupled radio frequency discharge: The effect of power-off duration
The effect of the pulse-off duration on the time evolution of the plasma and electrical
parameters during the ignition phase in a pulsed capacitively coupled radio frequency argon …
parameters during the ignition phase in a pulsed capacitively coupled radio frequency argon …
Experimental study on the ignition process of a pulsed capacitively coupled RF discharge: Effects of gas pressure and voltage amplitude
XY Wang, XK Wang, K Zhao, YX Liu, YN Wang - Physics of plasmas, 2022 - pubs.aip.org
The effects of gas pressure and voltage amplitude on the ignition process of a pulse
capacitively coupled RF argon discharge are experimentally investigated. The electron …
capacitively coupled RF argon discharge are experimentally investigated. The electron …
Experimental and PIC MCC study of electron cooling—re-heating and plasma density decay in low pressure rf ccp argon afterglow
OV Proshina, TV Rakhimova, AS Kovalev… - Plasma Sources …, 2020 - iopscience.iop.org
In this work, experimental and theoretical study of pulsed discharge in argon has been
carried out. The experimental data on the dynamics of electron density, electron …
carried out. The experimental data on the dynamics of electron density, electron …
Wafer Scale Insulation of High Aspect Ratio Through-Silicon Vias by iCVD
V Jousseaume, C Guerin, K Ichiki… - … Applied Materials & …, 2024 - ACS Publications
In microelectronics, one of the main 3D integration strategies consists of vertically stacking
and electrically connecting various functional chips using through-silicon vias (TSVs). For …
and electrically connecting various functional chips using through-silicon vias (TSVs). For …
Atmospheric plasma VUV photon emission
Owing to its distinctive photon energy range, vacuum ultraviolet (VUV) emission plays a key
role in diverse photo-induced natural and technological processes. Atmospheric-pressure …
role in diverse photo-induced natural and technological processes. Atmospheric-pressure …
Effect of terminal methyl group concentration on critical properties and plasma resistance of organosilicate low-k dielectrics
Surfactant-templated porous organosilicate glass low-k films have been deposited by using
a tetraethoxysilane (TEOS) and methyltriethoxysilane (MTEOS) mixture with different ratios …
a tetraethoxysilane (TEOS) and methyltriethoxysilane (MTEOS) mixture with different ratios …