Creating inorganic nanostructures for development of nanoelectronic device components is
a highly active research area. The ability for manipulation of the chemistry of materials, as …

Here, we report synergistic nanostructured surfaces combining bactericidal and bacteria-
releasing properties. A polystyrene-block-poly (methyl methacrylate)(PS-block-PMMA) …

Since their inception over 60 years ago, block copolymers have ripened to a state that has
extraordinary impacts on chemistry, physics, biology, materials science, and engineering …

Directed self-assembly of block copolymers (BCP) is a very attractive technique for the
realization of functional nanostructures at high resolution. In this work, we developed full dry …

The dissipative particle dynamics (DPD) simulation method has been shown to be a
promising tool to study self-assembly of soft matter systems. In particular, it has been used to …

Small angle x-ray scattering was used to study the morphology of conical structures formed
in thin films of amorphous SiO 2. Samples were irradiated with 1.1 GeV Au ions at the GSI …

Nanolithography with self‐assembled block copolymers (BCPs) is an emerging competitive
alternative to conventional lithography, which is currently reaching its limits with regard to …

Abstract Directed Self-Assembly of block copolymers is a lithographic technique being
developed to reach sub-10 nm technological nodes. Recently, high chi block copolymers …

Directed self-assembly (DSA) of block copolymers (BCPs) is an advanced patterning
technique being investigated to obtain small and dense patterns for future technological …

For sub-10 nm technologies, the semiconductor industry is facing the limits of conventional
lithography to achieve narrow dimensions. Directed self-assembly (DSA) of block …