[PDF][PDF] 基于交替相移掩模矢量空间像的偏振像差检测方法
沈丽娜， 王向朝， 李思坤， 闫观勇， 诸波尔， 孟泽江… - 光学学报, 2016 - researching.cn
摘要提出一种基于交替相移掩模空间像的光刻机投影物镜偏振像差检测方法. 采用泡利G
泽尼克系数表征偏振像差, 结合X 和Y 两种线性偏振照明方式, 用像传感器测量不同照明条件下 …
泽尼克系数表征偏振像差, 结合X 和Y 两种线性偏振照明方式, 用像传感器测量不同照明条件下 …
Polarization characteristics of state-of-art lithography optics reconstructed from on-body measurement
T Fujii, J Kogo, K Suzuki… - Optical Microlithography …, 2008 - spiedigitallibrary.org
In hyper-NA imaging, the vector properties of the light become important. Therefore, to
characterize and to fully exploit the state-of-the-art lithographic apparatus, reconstruction of …
characterize and to fully exploit the state-of-the-art lithographic apparatus, reconstruction of …
Jones pupil metrology of lithographic projection lens and its optimal configuration in the presence of error sources
Z Meng, S Li, X Wang, Y Bu, J Wang, S Ni, C Yang… - Optics …, 2019 - opg.optica.org
Mueller matrix imaging polarimeter (MMIP) can be used to measure the polarization
aberration (PA) of a lithographic projector in the form of the Mueller pupil, while the Jones …
aberration (PA) of a lithographic projector in the form of the Mueller pupil, while the Jones …
[PDF][PDF] 膜系引入偏振像差对投影光刻物镜设计的影响与改进
尚红波， 刘春来， 张巍， 陈华男 - 光学学报, 2015 - researching.cn
摘要为了实现高成像要求, 投影光刻物镜在设计时需要考虑膜层偏振效应的影响,
并进行相应的分析和评价. 首先介绍了基于琼斯矩阵的偏振像差理论, 然后以一个数值孔径(NA) …
并进行相应的分析和评价. 首先介绍了基于琼斯矩阵的偏振像差理论, 然后以一个数值孔径(NA) …
[PDF][PDF] Polarization wavefront reconstruction method based on JPN representation
T Fujii, M Sawada - 4th immersion symposium in Keystone …, 2007 - researchgate.net
In hyper-NA imaging, in agreement with its nature, the light acts as vector. Therefore, to
characterize and to fully exploit the state-of-the-art lithographic apparatus, reconstruction of …
characterize and to fully exploit the state-of-the-art lithographic apparatus, reconstruction of …
True polarization characteristics of hyper-NA optics excluding impact of measurement system
T Fujii, K Muramatsu, N Matsuo… - Optical …, 2009 - spiedigitallibrary.org
High lens numerical aperture for improving the resolution of a lithographic lens requires a
high incident angle of exposure light in resist, which induces the vectorial effect. As a result …
high incident angle of exposure light in resist, which induces the vectorial effect. As a result …
Application of canonical coordinates for solving single-freedom constraint mechanical systems
F Gao, X Zhang, J Fu - Applied Mathematics and Mechanics, 2014 - Springer
This paper introduces the canonical coordinates method to obtain the first integral of a single-
degree freedom constraint mechanical system that contains conservative and non …
degree freedom constraint mechanical system that contains conservative and non …
Experimental result of polarization characteristics separation method
T Fujii, K Suzuki, J Kogo, K Toyama… - Optical …, 2010 - spiedigitallibrary.org
The use of high lens numerical aperture for improving the resolution of a lithographic lens
requires a high incident angle of exposure light in resist, which induces vectorial effects. As …
requires a high incident angle of exposure light in resist, which induces vectorial effects. As …
Resolution enhancement technology for ArF dry lithography at 65 nm node
S Gao, Y Li - … on Advanced Optical Manufacturing and Testing …, 2007 - spiedigitallibrary.org
The performance of ArF dry lithography at 65 nm node was studied together with RET.
Commercial software Prolith 9.0 and in-house-software MicroCruiser 5.0 were used for …
Commercial software Prolith 9.0 and in-house-software MicroCruiser 5.0 were used for …