Low-loss photonic device in Ge–Sb–S chalcogenide glass
Low-loss waveguides constitute an important building block for integrated photonic systems.
In this work, we investigated low-loss photonic device fabrication in Ge_23Sb_7S_70 …
In this work, we investigated low-loss photonic device fabrication in Ge_23Sb_7S_70 …
AlN Etching under ICP Cl2/BCl3/Ar Plasma Mixture: Experimental Characterization and Plasma Kinetic Model
M Rammal, A Rhallabi, D Néel, D Make, A Shen… - MRS …, 2019 - cambridge.org
AlN etching with chloride plasmas is studied. The experimental results show that the etching
of AlN under a low pressure Cl2/Ar plasma mixture in moderate DC bias is not possible. The …
of AlN under a low pressure Cl2/Ar plasma mixture in moderate DC bias is not possible. The …
Characterization of Plasma Induced Damage and Strain on InP Patterns and Their Impact on Luminescence
M Fouchier, M Fahed, E Pargon, N Rochat… - MRS …, 2018 - cambridge.org
The effect of damage induced by plasma etching on the cathodoluminescence intensity of
micron-size InP features is studied. At the etched bottom, it is found that the hard mask …
micron-size InP features is studied. At the etched bottom, it is found that the hard mask …
[PDF][PDF] TECHNOLOGIES POUR SOURCES LASER A SEMICONDUCTEURS III-V
S Bouchoule - 2018 - theses.hal.science
A l'issue de ma thèse de doctorat, j'ai été recrutée au CNET, Laboratoire de Bagneux, dans
le département «Sources à Semi-Conducteurs», pour concevoir et fabriquer en salle …
le département «Sources à Semi-Conducteurs», pour concevoir et fabriquer en salle …
[引用][C] Dancing angels on the point of a needle: nanofabrication for subwavelength optics
M Shalaginov, DH Werner… - …, 2020 - Institution of Engineering and …