Designing high χ copolymer materials for nanotechnology applications: A systematic bulk vs. thin films approach
PP Angelopoulou, I Moutsios, GM Manesi… - Progress in Polymer …, 2022 - Elsevier
This review article discusses the origins of self-assembly behavior of linear and non-linear
block co-and terpolymers and their application towards the fabrication of high-resolution …
block co-and terpolymers and their application towards the fabrication of high-resolution …
Nanoparticle Assembly: From Self‐Organization to Controlled Micropatterning for Enhanced Functionalities
Nanoparticles form long‐range micropatterns via self‐assembly or directed self‐assembly
with superior mechanical, electrical, optical, magnetic, chemical, and other functional …
with superior mechanical, electrical, optical, magnetic, chemical, and other functional …
High Aspect Ratio Nanoscale Pores through BCP-Based Metal Oxide Masks and Advanced Dry Etching
The reliable and regular modification of the surface properties of substrates plays a crucial
role in material research and the development of functional surfaces. A key aspect of this is …
role in material research and the development of functional surfaces. A key aspect of this is …
A new and versatile template towards vertically oriented nanopillars and nanotubes
Vertically oriented nanostructures bring unparalleled high surface area, light trapping
capability, and high device density to electronic, optoelectronic, and energy storage devices …
capability, and high device density to electronic, optoelectronic, and energy storage devices …
Controlled Anisotropic Wetting by Plasma Treatment for Directed Self-Assembly of High-χ Block Copolymers
AF Putranto, C Petit-Etienne, S Cavalaglio… - … Applied Materials & …, 2024 - ACS Publications
The directed self-assembly (DSA) of block copolymers (BCPs) is a promising next-
generation lithography technique for high-resolution patterning. However, achieving …
generation lithography technique for high-resolution patterning. However, achieving …
Hydrolysis-Induced Morphology Evolution of Linear and Bottlebrush Block Copolymers in Thin Films with Acid Vapor or Photoacid Generators
The self-assembly of high-χ low-N block copolymers (BCPs) can give patterns with sub-10
nm full pitch, serving as a promising alternative to photolithographic methods. In this work …
nm full pitch, serving as a promising alternative to photolithographic methods. In this work …
[PDF][PDF] 亚十纳米导向自组装与深紫外混合光刻技术
李自力， 胡晓华， 熊诗圣 - Laser & Optoelectronics Progress, 2022 - researching.cn
摘要光刻图形化工艺对芯片制造乃至于现代信息技术的发展起着至关重要的作用.
随着微电子器件关键尺寸的持续微缩, 芯片制造工艺日益演进, 迫切需要立足国内产业现状 …
随着微电子器件关键尺寸的持续微缩, 芯片制造工艺日益演进, 迫切需要立足国内产业现状 …
Grain size effect on the plasma etching behavior of spark plasma sintered yttria-stabilized zirconia ceramics
Yttria-stabilized zirconia (YSZ) ceramics with various grain sizes were fabricated via a spark
plasma sintering (SPS), and their plasma etching properties were investigated, particularly …
plasma sintering (SPS), and their plasma etching properties were investigated, particularly …
[PDF][PDF] Fabrication of Nanoporous Membrane-like Thin Layers via Block Copolymer Lithography of P2VP-b-PS “Inverse” Systems and their Potential Applications
AE Paiva - 2024 - tara.tcd.ie
The large-scale fabrication of nanoporous materials and substrates has generated
significant research interest on account of the wide range of possible applications, including …
significant research interest on account of the wide range of possible applications, including …