AI Saifutdinov, SS Sysoev - Plasma Sources Science and …, 2023 - iopscience.iop.org
The paper presents the results of studies of plasma parameters and kinetics of fast electrons in the region of negative glow of a discharge with a microhollow cathode at high pressures …
In this study we describe the deposition, transfer and electrical properties of non- stoichiometric amorphous boron nitride, namely aB 0.69 N, to prove its potential for van der …
Low-pressure plasmas, in particular magnetron sputtering discharges, are increasingly used for the deposition of wideband gap semiconductor nitrides films (eg, GaN or AlN) …
A Remigy, B Menacer, K Kourtzanidis… - Plasma Sources …, 2024 - iopscience.iop.org
In this work, nanosecond two-photon absorption laser induced fluorescence (TALIF) is used to perform spatial mappings of the absolute density of nitrogen atoms generated in a micro …
A plasma-enhanced chemical vapour deposition process based on a micro-plasma working in argon/nitrogen mixture and using a bromide precursor is used to grow boron nitride …
L'objectif de cette thèse est de contribuer à la compréhension du fonctionnement des microdécharges à cathode creuse (MHCD) et leur potentiel d'application à la production …