Advancements in optical lithography tools, processes, and patterning materials have been
critical to the continued performance increases of semiconductor devices as well as to the …

In the search for higher resolution, modern day imaging systems frequently employ objective
lenses with a high numerical aperture. Propagation of light through such lenses introduces a …

The acceleration of integrated circuit miniaturization is challenging lithographers to push the
limits of optical lithography by ever more precise engineering and innovations. As IC device …

Here for the first time is an integrated mathematical view of the physics and numerical
modeling of optical projection lithography that efficiently covers the full spectrum of the …

Electromagnetic modeling of finite structures and finite illumination for metrology and
inspection are described herein. In one embodiment, a method for evaluating a diffracting …

ArF lithography is approaching its limit past the 90-nm node. F 2 lithography using 157-nm
light seems to be a natural extension to the next node. However, several key problems in F 2 …

To understand polarization effects in image formation for critical structures, a model based
on the pupil approach and the Fourier modal method is presented for numerical simulation …

Definitions and criteria for “resolution” and “resolution enhancement” are discussed, and the
primary resolution enhancement techniques (RETs) of OPC, PSM and OAI are categorized …

5,308,991 A 5/1994 Kaplan 5,528,508 A 6, 1996 Russell et al. 5,573,890 A 11/1996 Spence
5,705.301 A 1/1998 Garza et al. 5,858,580 A 1/1999 Wang et al. 5,862,058 A 1/1999 …

Imaging confocal microscopy is a well-known technology for the 3D measurement of surface
topography. A confocal microscope is used for the acquisition of a sequence of confocal …