D Shi, Y Chen, Z Li, S Dong, L Li, M Hou, H Liu… - Small …, 2022 - Wiley Online Library
Wet etching of silicon carbide typically exhibits poor etching efficiency and low aspect ratio. In this study, an etching structure that exploits anisotropic charge carrier flow to enable high …
Sculpting silicon at the micro and nano scales has been game‐changing to mold bulk silicon properties and expand, in turn, applications of silicon beyond electronics, namely, in …
Although the olefin-based polymerizable sol–gel (PSG) approach has brought about significant advancements in the domain of direct and scalable nanoimprinting of oxides, the …
K Kim, S Choi, H Bong, H Lee, M Kim, J Oh - Nanoscale, 2023 - pubs.rsc.org
Metal-assisted chemical etching (MACE) has received much attention from researchers because it can be used to fabricate plasma-free anisotropic etching profiles for …
Y Yin, J Zhang, Y Ma, J Huo, K Zhao, X Meng… - IEEE …, 2020 - ieeexplore.ieee.org
Electrochemical machining (ECM) is a proven processing technique for fabricating difficult-to- cut nickel-based superalloys with complex shapes using the principle of anodic dissolution …
R Umezaki, J Murata - Materials Chemistry and Physics, 2021 - Elsevier
Well-defined surface patterns can be applied to improve surface characteristics, optical properties, and wettability. Electrochemical imprint lithography is a promising method for …
H Xu, L Han, JJ Su, ZQ Tian, D Zhan - Science China Chemistry, 2022 - Springer
Free of any thermoplastic or photocuring resists, electrochemical nanoimprint lithography (ECNL) has emerged as an alternative nanoimprint way to fabricate three-dimensional …
W Sun, H Xu, L Han, C Wang, Z Ye, JJ Su, YF Wu… - Electrochimica …, 2023 - Elsevier
Metal assisted chemical etching (MACE), as an emerging wet chemical etching method for fabricating semiconductor micro/nano-structures (MNS), has attracted wide attentions …
B Liu, L Han, H Xu, JJ Su, D Zhan - Chemistry–An Asian …, 2023 - Wiley Online Library
Electrochemical nanoimprint lithography (ECNL) has emerged as a promising technique for fabricating three‐dimensional micro/nano‐structures (3D‐MNSs) directly on semiconductor …