Recent advances in nanowire-based wearable physical sensors

J Gu, Y Shen, S Tian, Z Xue, X Meng - Biosensors, 2023 - mdpi.com
Wearable electronics is a technology that closely integrates electronic devices with the
human body or clothing, which can realize human–computer interaction, health monitoring …

Anisotropic charge transport enabling high‐throughput and high‐aspect‐ratio wet etching of silicon carbide

D Shi, Y Chen, Z Li, S Dong, L Li, M Hou, H Liu… - Small …, 2022 - Wiley Online Library
Wet etching of silicon carbide typically exhibits poor etching efficiency and low aspect ratio.
In this study, an etching structure that exploits anisotropic charge carrier flow to enable high …

Voltage‐and Metal‐assisted Chemical Etching of Micro and Nano Structures in Silicon: A Comprehensive Review

S Surdo, G Barillaro - Small, 2024 - Wiley Online Library
Sculpting silicon at the micro and nano scales has been game‐changing to mold bulk silicon
properties and expand, in turn, applications of silicon beyond electronics, namely, in …

Chemically amplified molecular resins for shrinkage-controlled direct nanoimprint lithography of functional oxides: an application towards dark-light dual-mode …

R Nagarjuna, A Thakur, A Balapure… - Materials …, 2024 - pubs.rsc.org
Although the olefin-based polymerizable sol–gel (PSG) approach has brought about
significant advancements in the domain of direct and scalable nanoimprinting of oxides, the …

Catalytic nickel silicide as an alternative to noble metals in metal-assisted chemical etching of silicon

K Kim, S Choi, H Bong, H Lee, M Kim, J Oh - Nanoscale, 2023 - pubs.rsc.org
Metal-assisted chemical etching (MACE) has received much attention from researchers
because it can be used to fabricate plasma-free anisotropic etching profiles for …

Electrochemical dissolution behavior of nickel-based Hastelloy X superalloy at low current densities

Y Yin, J Zhang, Y Ma, J Huo, K Zhao, X Meng… - IEEE …, 2020 - ieeexplore.ieee.org
Electrochemical machining (ECM) is a proven processing technique for fabricating difficult-to-
cut nickel-based superalloys with complex shapes using the principle of anodic dissolution …

Electrochemical imprint lithography on Si surface using a patterned polymer electrolyte membrane

R Umezaki, J Murata - Materials Chemistry and Physics, 2021 - Elsevier
Well-defined surface patterns can be applied to improve surface characteristics, optical
properties, and wettability. Electrochemical imprint lithography is a promising method for …

Spatially-separated and photo-enhanced semiconductor corrosion processes for high-efficient and contamination-free electrochemical nanoimprint lithography

H Xu, L Han, JJ Su, ZQ Tian, D Zhan - Science China Chemistry, 2022 - Springer
Free of any thermoplastic or photocuring resists, electrochemical nanoimprint lithography
(ECNL) has emerged as an alternative nanoimprint way to fabricate three-dimensional …

CMOS-compatible electrochemical nanoimprint: High throughput fabrication of ordered microstructures on semiconductor wafer by using a glassy carbon mold

W Sun, H Xu, L Han, C Wang, Z Ye, JJ Su, YF Wu… - Electrochimica …, 2023 - Elsevier
Metal assisted chemical etching (MACE), as an emerging wet chemical etching method for
fabricating semiconductor micro/nano-structures (MNS), has attracted wide attentions …

Ultrasonic‐Assisted Electrochemical Nanoimprint Lithography: Forcing Mass Transfer to Enhance the Localized Etching Rate of GaAs

B Liu, L Han, H Xu, JJ Su, D Zhan - Chemistry–An Asian …, 2023 - Wiley Online Library
Electrochemical nanoimprint lithography (ECNL) has emerged as a promising technique for
fabricating three‐dimensional micro/nano‐structures (3D‐MNSs) directly on semiconductor …