[HTML][HTML] From basics to frontiers: A comprehensive review of plasma-modified and plasma-synthesized polymer films

T Dufour - Polymers, 2023 - mdpi.com
This comprehensive review begins by tracing the historical development and progress of
cold plasma technology as an innovative approach to polymer engineering. The study …

High-performance etchless lithium niobate layer electro-optic modulator enabled by quasi-BICs

G Liu, S Zong, X Liu, J Chen, Z Liu - Optics Letters, 2024 - opg.optica.org
A facile strategy is proposed for a high-performance electro-optic modulator with an etchless
lithium niobate (LN) layer assisted by the silicon resonator metasurface, which pioneers the …

Elimination of Pinhole Defects in Self-Aligned Double Patterning Process by using Bias Pulsed Plasma

WP Lien, JY Jeff, YS Wu, R Chiu… - 2024 35th Annual SEMI …, 2024 - ieeexplore.ieee.org
Self-aligned double patterning (SADP) is extensively utilized in advanced sub-20nm
technology nodes. The DRAM digit contact SADP dry etch process experienced severe yield …

Investigation of the influence of hardmask morphology on bowing effect in nano-scale silicon plasma etching process

Z Hu, J Li, H Shao, R Chen… - Advanced Etch Technology …, 2024 - spiedigitallibrary.org
Bowing is one of plasma etching effects that negatively impact device performance.
Although there has been plenty of research work on micro-feature surface etch modeling to …