Atomic layer etching (ALE) is a technique for removing thin layers of material using
sequential reaction steps that are self-limiting. ALE has been studied in the laboratory for …

The ability to achieve near-atomic precision in etching different materials when transferring
lithographically defined templates is a requirement of increasing importance for nanoscale …

Abstract Journal of Physics D: Applied Physics published the first Plasma Roadmap in 2012
consisting of the individual perspectives of 16 leading experts in the various sub-fields of low …

The embodiments herein relate to methods and apparatus for etching a recessed feature in
dielectric material. In various embodiments, a recessed feature is formed in two etching …

The spread of bacteria through contaminated surfaces is a major issue in healthcare, food
industry, and other economic sectors. The widespread use of antibiotics is not a sustainable …

Low temperature plasma (LTP)-based synthesis of advanced materials has played a
transformational role in multiple industries, including the semiconductor industry, liquid …

Although pulse-modulated plasma has overcome various problems encountered during the
development of the high aspect ratio contact hole etching process, there is still a lack of …

Plasma functionalization can increase the efficiency of MoSe2 in the hydrogen evolution
reaction (HER) by providing multiple species but the interactions between the plasma and …

In this study, using three isomers (1, 1, 1, 3, 3, 3-hexafluoropropane (HFC-236fa), 1, 1, 1, 2,
3, 3-hexafluoropropane (HFC-236ea), 1, 1, 2, 2, 3, 3-hexafluoropropane (HFC-236ca)) …

As aspect ratios of features in microelectronics fabrication increase to beyond 100,
transferring patterns using plasma etching into underlying materials becomes more …